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Preparation method of copper film stripping liquid in liquid crystal display

A technology of liquid crystal display and stripping liquid, which is applied in the direction of photographic plate-making technology, instruments, and optical mechanical equipment on the patterned surface, which can solve problems such as damage to the human body and the environment, large environmental pollution, and harm to human health, so as to avoid damage and reduce Temperature, Effect of Improving Photoresist Stripping Performance

Inactive Publication Date: 2018-04-06
无锡南理工新能源电动车科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health
[0006] Therefore be necessary to provide a kind of improved copper film water system photoresist stripping solution and preparation method thereof, improve the photoresist stripping performance in the thin-film liquid crystal display manufacturing process, reduce process condition temperature, and avoid the positive glue stripping solution that uses originally to cause Damage to humans and the environment

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Example 1. Weigh 10kg of alkoxyalkylamine, and then slowly add it into a reaction kettle filled with appropriate deionized water through an automatic feeding system, and stir fully. The stirring temperature is 40 degrees, and the stirring pressure is 1.2Mpa , the stirring time is 10 minutes, and the stirring speed is 45 rpm;

[0019] Then take by weighing 12kg of triethanolamine solution, 1.2kg of low-boiling organic solvent, 5kg of vinyl n-butyl ether, 2.5kg of isopropyl n-sulfide, 0.2kg of aprotic solvent and suitable deionized water, and Fully stir, the stirring temperature is 30 degrees, the stirring air pressure is 2.2Mpa, the stirring time is 15 minutes, and the stirring speed is 55 rpm;

[0020] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain a copper film water-based photore...

Embodiment 2

[0022] Example 2. Weigh 13kg of alkoxyalkylamine, and then slowly add it into a reaction kettle filled with appropriate deionized water through an automatic feeding system, and stir fully. The stirring temperature is 50 degrees, and the stirring pressure is 1.7Mpa , the stirring time is 12 minutes, and the stirring speed is 45 rpm;

[0023] Then take by weighing 17kg of triethanolamine solution, 2.2kg of low-boiling organic solvent, 10kg of vinyl n-butyl ether, 4.5kg of isopropyl n-sulfide, 0.4kg of aprotic solvent and suitable deionized water, and Fully stir, the stirring temperature is 35 degrees, the stirring air pressure is 2.9Mpa, the stirring time is 20 minutes, and the stirring speed is 65 rpm;

[0024] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2.5 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain a copper film water-based phot...

Embodiment 3

[0026] Example 3. Weigh 16kg of alkoxyalkylamine, and then slowly add it into a reaction kettle filled with appropriate deionized water through an automatic feeding system, and stir fully. The stirring temperature is 60 degrees, and the stirring pressure is 2.3Mpa , the stirring time is 15 minutes, and the stirring speed is 45 rpm;

[0027] Then take by weighing 20kg of triethanolamine solution, 2.8kg of low-boiling organic solvent, 15kg of vinyl n-butyl ether, 6.9kg of isopropyl n-sulfide, 0.6kg of aprotic solvent and suitable deionized water, and Fully stir, the stirring temperature is 40 degrees, the stirring air pressure is 3.3Mpa, the stirring time is 25 minutes, and the stirring speed is 75 rpm;

[0028] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 3 hours, and then filter it through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain a copper film water-based pho...

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Abstract

The invention discloses a preparation method of a copper film stripping liquid in a liquid crystal display. The stripping liquid comprises the following compositions in percentages by weight: 10% to 16% of alkoxy alkyl amine, 12% to 20% of a triethanolamine solution, 1.2% to 2.8% of a low-boiling-point organic solvent, 5% to 15% of vinyl n-butyl ether, 2.5% to 6.9% of isopropyl dipropyl sulfide, 0.2% to 0.6% of a non-protonic solvent and the balance of deionized water. According to the copper film water system light resistance stripping liquid provided by the invention, the light resistance stripping performance of a thin film liquid crystal display panel can be improved, the temperature in technological conditions is reduced, and the damage of an originally used positive photoresist striping liquid caused for human bodies and the environment is avoided.

Description

technical field [0001] The invention relates to a preparation method of a copper film stripping liquid in a liquid crystal display. Background technique [0002] At present, the low-temperature water-based positive glue stripper is a transparent and volatile liquid, flammable, and its density (25°C) is about 1.0g / ml. Copper film water-based photoresist stripping solution is mainly used for photoresist stripping in the production of thin-film liquid crystal display panels, and its operating temperature is about 80°C; Composed of ultrapure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [0004] 2) The low-temperature water-based positive glue stripping solution requires a high process temperature and needs to be heated to about 80°C, which ...

Claims

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Application Information

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IPC IPC(8): G03F7/42
CPCG03F7/422
Inventor 陈昊朱德意章锋
Owner 无锡南理工新能源电动车科技发展有限公司
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