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Low-temperature aqueous positive-photoresist stripping solution and preparation method thereof

A low-temperature stripping liquid technology, which is applied in the processing of photosensitive materials, can solve the problems of large environmental pollution and human health damage, and achieve the effect of reducing the temperature of process conditions, avoiding damage, and improving the stripping performance of photoresist

Inactive Publication Date: 2012-07-11
JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0031] Example 1. Weigh 30kg of NMP, add it into a reaction kettle with 10kg of water under stirring, stir well for 15 minutes, add DMAC26kg, BDG24.2kg, add water to 100kg, stir for 20 minutes, and pass the prepared mixture through 0.5 um filter for 2 hours, and then filtered through a 0.2μm filter to remove harmful particles with a particle size greater than 0.2μm in the mixture, and then the low-temperature water-based positive glue stripping solution is obtained.

example 2

[0032] Example 2. Weigh 30kg of NMP, add it into a reaction kettle with 10kg of water under stirring, stir well for 15 minutes, add 26kg of DMAC, 24.5kg of BDG, add water to 100kg, stir for 20 minutes, and pass the prepared mixture through 0.5 um filter for 2 hours, and then filtered through a 0.2μm filter to remove harmful particles with a particle size greater than 0.2μm in the mixture, and then the low-temperature water-based positive glue stripping solution is obtained.

example 3

[0033] Example 3. Weigh 30kg of NMP, add it into a reaction kettle with 10kg of water under stirring, stir well for 15 minutes, add 26kg of DMAC, 25kg of BDG, add water to 100kg, stir for 20 minutes, and filter the obtained mixture through 0.5um Circulate and filter for 2 hours, and then filter through a 0.2 μm filter to remove harmful particles with a particle size larger than 0.2 μm in the mixture, and obtain a low-temperature water-based positive glue stripping solution.

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PUM

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Abstract

The invention discloses a low-temperature aqueous positive-photoresist stripping solution and a preparation method thereof. The low-temperature aqueous positive-photoresist stripping solution comprises the following components in percentage by weight: 29-31% of N-methyl-pyrrolidinone, 23.7-27.7% of dimethylacetylamide, 24-26% of diethylene glycol monobutyl ether, and 17-23% of water. By using the low-temperature aqueous positive-photoresist stripping solution and the preparation method thereof disclosed by the invention, the light-resistant stripping performance of a product can be improved, the technological condition temperature can be reduced, and the damage on human bodies and environments caused by an original-used positive-photoresist stripping solution is avoided.

Description

technical field [0001] The invention relates to a positive glue stripping liquid and a preparation method thereof, in particular to a low-temperature water-based positive glue stripping liquid used for photoresist stripping in FPD panel production and a preparation method thereof. Background technique [0002] Low-temperature water-based positive glue stripper, transparent and volatile liquid, flammable, density (20°C) about 1.0g / ml. Low-temperature water-based positive resist stripping solution is mainly used for photoresist stripping in FPD (Flat Panel Display, flat panel display) panel production, and its use process temperature is about 80°C; Composed of sulfoxide (DMSO) and ultrapure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
Inventor 殷福华季文庆朱龙邵勇栾成
Owner JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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