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Method and system for technological control

A technology of process control and process parameters, applied in general control system, control/adjustment system, comprehensive factory control, etc., can solve problems affecting process time and yield, setting time is not long enough, not accurate enough, etc., to achieve improvement The effects of production efficiency, avoiding unstable process parameters, and precise process end control

Active Publication Date: 2015-09-30
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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AI Technical Summary

Problems solved by technology

[0004] In this setting method, in order to avoid the setting time being not long enough, a time value with a large margin is often set, resulting in the fact that it can be stabilized in a shorter time, and it takes more time to wait. Affects process time and yield
And the time value set by experience may deviate in some special cases, which is not accurate enough

Method used

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  • Method and system for technological control

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Embodiment Construction

[0046] In order to make the object, technical solution and advantages of the present invention clearer, the specific implementation of the process control method and system of the present invention will be described below with reference to the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0047] A method of process control in the embodiment of the present invention, such as figure 1 shown, including the following steps:

[0048] S100, cyclically detect each process parameter that needs to reach a stable state within a preset stable time, and obtain a detection result.

[0049] S200. According to the detection result, when all the detected process parameters reach the corresponding preset stable state, the control ends the current process step; otherwise, an unstable alarm is issued if the preset stable time is exceeded.

[0050] After the proces...

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Abstract

The invention discloses a method and system for technological control. The method comprises the following steps: detecting all technological parameters of a needed steady state in a preset stable time, and obtaining a detection result; controlling the ending of a current technological step according to the detection result when all the detected technological parameters reaches the corresponding preset steady state, or giving a unsteady alarm when the preset steady time is exceeded. According to the actual progress condition of the technological steps, the ending of the technological steps is controlled, and there is no need to preset a longer technological machining time, thereby shortening the technological machining time of a semiconductor, and improving the overall production efficiency. Meanwhile, the method and system prevent the setting of a fixed ending time from causing a condition of unsteady technological parameters under certain special conditions during the switching to a next step, and are more precise in technological ending control.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to a process control method and system. Background technique [0002] In the semiconductor process, a process (Process) is composed of a certain number of process steps (step), and each step will specify the end condition according to the need. There are several types of this condition, which we call the end point type. , such as a time-end type that takes a certain time as the end criterion. [0003] As the process becomes more and more complex, there are more and more requirements for the end point type. In some process processing, the process function of some process steps is to make the set parameters stable and then end. In this type In the process steps, all relevant parameters need to be stable. For this kind of process steps, the traditional technology adopts the time end point type, and sets a relatively safe and relatively large time value as the basis for judging the stabi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B19/418H01L21/67
CPCG05B19/41865H01L21/67Y02P90/02
Inventor 李娟娟
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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