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Source collector apparatus, lithographic apparatus and method

A collector and equipment technology, applied in the field of source collector equipment, can solve the problems of insufficient wafer exposure, time-consuming, waste, etc.

Active Publication Date: 2018-06-19
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it was found that adjusting the necessary parameters of the fuel droplet generator during operation is a very time-consuming process
Also, the need to adjust the parameters of the fuel droplet generator may only be apparent when performance degradation has occurred and wafers have been wasted due to insufficient exposure

Method used

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  • Source collector apparatus, lithographic apparatus and method
  • Source collector apparatus, lithographic apparatus and method
  • Source collector apparatus, lithographic apparatus and method

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Embodiment Construction

[0034]This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiments illustrate the invention only. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0035] Embodiments described in this specification and references to "one embodiment," "an embodiment," "exemplary embodiment," etc., mean that the described embodiment may include a particular feature, structure, or characteristic, but each An embodiment does not necessarily include the particular feature, structure or characteristic. Additionally, such terms are not necessarily referring to the same embodiment. In addition, when a particular feature, structure or characteristic is described in conjunction with an embodiment, it should be understood that it is within the knowledge of those skilled in the art to use such feature, structure or characteristic in combination with other embodime...

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PUM

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Abstract

A source collector arrangement for use in a lithographic apparatus, the source collector arrangement comprising: a fuel droplet generator (4) configured to generate, in use, an outlet from the fuel droplet generator towards a plasma A flow (6) of fuel droplets guided by the point (7) is formed. In order to prevent the disturbance of plasma formation by droplet cohorts, gas supply means are provided to provide, in use, a gas flow (A), such as a flow of hydrogen, which deflects any by-product droplets out of said fuel droplet stream. Additionally, a detection device may be provided as part of the shroud (5) to determine the point at which coalescence of fuel droplets occurs, thereby providing an indication of the likelihood of the presence of accompanying droplets in the fuel droplet stream.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application 61 / 809,027, filed April 5, 2013. The entirety of this provisional application is hereby incorporated by reference. technical field [0003] The present invention relates to a source collector arrangement, in particular for use in a lithographic apparatus, and a method for attenuating the potentially negative effects of satellite droplets in a fuel droplet stream and equipment. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a target portion of a substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate a circuit pattern corresponding to a single layer of the IC. The pattern can be imaged onto a target portion (eg, comprising a portion, one o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H05G2/00
CPCG03F7/70033H05G2/003H05G2/008
Inventor N·克里曼斯D·格卢什科夫R·豪特曼B·伦肯斯G·斯温克尔斯C·沃斯比克
Owner ASML NETHERLANDS BV
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