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Process for processing display screen array substrate

A technology of array substrate and processing technology, which is applied in the field of display array substrate processing technology, can solve the problems such as poor line width uniformity of glass substrates, and achieve the effect of improving line width uniformity

Active Publication Date: 2015-12-02
EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above problems, the purpose of the present invention is to provide a display array substrate processing technology to solve the problem of poor uniformity of the line width of the glass substrate obtained in the prior art

Method used

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  • Process for processing display screen array substrate
  • Process for processing display screen array substrate
  • Process for processing display screen array substrate

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Embodiment Construction

[0021] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific embodiments.

[0022] see figure 2 , display array substrate processing technology (taking the yellow light production line as an example), including:

[0023] Obtain the line width statistics of the final sample of the array substrate: provide several pixel substrates, and sequentially perform photoresist slit coating, decompression drying, pre-baking, exposure, development, and post-baking processes on the plain substrates, and thus obtain A pattern substrate with a photoresist mask, the line width test of the photoresist pattern is carried out on the pattern substrate, and then the photoresist is stripped by etching to obtain a metal or non-metal pattern substrate, and the formed metal or non-metallic pattern for line width test to obtain the line widt...

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Abstract

The invention discloses a process for processing a display screen array substrate. The process comprises the steps of first obtaining line width statistic values of array substrate final samples, and according to the line width statistic values of the array substrate final samples, selecting a micro correction exposure device to perform tiny correction on the product line widths, so as to improve the line width uniformity of the whole array substrate.

Description

technical field [0001] The invention relates to the field of flat panel display processing, in particular to a processing technology of a display array substrate. Background technique [0002] In flat panel display manufacturing, line width uniformity (CDUniformity) is very important. However, the uniformity of product line width and multiple processes, such as photoresist slit coating (Coater), vacuum drying (VacuumDry), prebake (Prebake), exposure (Exposure), development (Developer), postbake (Postbake) ), etc. are closely related. Poor uniformity in any process will lead to poor line width uniformity of the product, resulting in a low level of product quality. [0003] In the current production line, the process sequence that has a greater impact on line width uniformity is as follows: figure 1 Shown (taking the yellow light production line as an example), including photoresist slit coating (Coater), vacuum drying (VacuumDry), prebake (Prebake), exposure (Exposure), de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G09G3/20
Inventor 朱棋锋
Owner EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD