Imprinting material

A base material and compound technology, applied in the field of imprinting materials, can solve problems such as unusable molds, achieve high scratch resistance, and expand the effect of process margin

Inactive Publication Date: 2018-01-30
NISSAN CHEM CORP
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

) is large, the resin tends to adhere to the mold, and the mold tends to become unusable

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Imprinting material
  • Imprinting material
  • Imprinting material

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0119] [Preparation of Imprint Material]

[0120] The production method of the imprint material of the present invention is not particularly limited, as long as (A) component, (B) component, (C) component, and (D) component, (E) component, (F) component and The component (G) may be mixed with other desired additives to bring the imprint material into a uniform state.

[0121] In addition, there is no problem in the order of mixing the components (A) to (G) and other additives as desired, as long as a uniform imprint material can be obtained, and is not particularly limited. As its preparation method, the method of mixing (B) component in a predetermined ratio with (A) component is mentioned, for example. In addition, there may also be mentioned a method in which (C)component, (D)component, (E)component, (F)component, and (G)component are further appropriately mixed to form a uniform imprint material. Furthermore, the method of adding and mixing other additives as needed at a...

Embodiment 1

[0137] 9.9 g of KAYARAD (registered trademark) DPEA-12 (hereinafter, abbreviated as "DPEA-12" in this specification) (manufactured by Nippon Kayaku Co., Ltd.) and N,N'-dimethylacrylamide (Tokyo Chemical Industry Co., Ltd. 0.1 g of Lucirin (registered trademark) TPO (manufactured by BASF JAPAN Co., Ltd.) (hereinafter referred to as "Lucirin TPO" in this specification) 0.25 g (relative to DPEA-12, N, N The total mass of '-dimethylacrylamide is 2.5phr), and the imprint material PNI-a1 is prepared.

Embodiment 2

[0139] 9.995 g of NK Ester A-200 (hereinafter referred to simply as "A-200" in this specification) (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) and 0.005 g of N,N'-dimethylacrylamide were mixed, and the mixture was mixed with Add 0.25g of Lucirin TPO (2.5phr relative to the total mass of A-200 and N,N'-dimethylacrylamide) to prepare the imprint material PNI-a2.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

An object of the present invention is to provide an imprint material that has sufficient adhesion to a film base material, has excellent scratch resistance, and can easily peel a resin film from a mold during mold release. The solution is an imprint material containing (A) a specific acrylamide such as N,N'-dimethylacrylamide, (B) an alkylene oxide unit having 2 to 6 polymerizable groups at the terminal compound, and the oxyalkylene unit is an oxyethylene unit, an oxypropylene unit, or a combination thereof and (C) a photopolymerization initiator.

Description

technical field [0001] The present invention relates to an imprint material (film-forming composition for imprint), and a film produced from the material and having a pattern transferred thereon. More specifically, it relates to an imprint material that can easily peel a resin film from a mold after curing and when releasing the mold, and an imprint material that is produced from the material, has excellent adhesion to a substrate, and has excellent scratch resistance. Also excellent for transferring patterned films. Background technique [0002] In 1995, Professor Chou of Princeton University and others proposed a new technology called nanoimprint lithography (Patent Document 1). The nanoimprint lithography technique is to bring a mold having an arbitrary pattern into contact with a substrate on which a resin film is formed, press the resin film, and use heat or light as an external stimulus to form a target pattern on the cured resin film. Compared with the photolithogra...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027B29C59/02C08F2/46
CPCC08F2/48C08F220/56C09D4/00C08F220/325G03F7/028H01L21/76817G03F7/027G03F7/0002C08L33/14
Inventor 小林淳平加藤拓铃木正睦
Owner NISSAN CHEM CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap