Aluminum-calcium-barium infrared glass with protective film and preparation method thereof
A technology of infrared glass and protective film, which is applied in the field of aluminum-calcium-barium infrared glass with protective film and its preparation, can solve the problems of large difference in expansion coefficient and insufficient adhesion of the film base, and achieve improved protective performance, simple structure, easy-to-prepare effects
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example 1
[0028] The preparation method of aluminum-calcium-barium infrared glass with a protective film is to ultrasonically clean the infrared glass substrate with acetone and ethanol for 15 minutes, put it into the substrate holder, and vacuumize to 2.0×10 -3 Pa, heated to 300°C, and held for 1 hour; Hall ion source was used to clean the Al-Ca-Barium infrared glass substrate before plating. Prepare the aluminum oxide layer by magnetron sputtering Al target, pass Ar into the vacuum chamber, keep the vacuum degree of the chamber at 0.5 Pa, start the glow, carry out backsputter cleaning on the Al target for 15 minutes; pass O 2 , where Ar / O 2 The ratio is 1:1.5, the indoor vacuum is 1Pa, and the thickness of the obtained alumina layer is 400nm; the silicon dioxide layer is prepared by radio frequency magnetron sputtering Si target, and Ar is introduced into the vacuum chamber to keep the indoor vacuum at 0.5Pa. , Qihui, backsplash cleaning the Si target, the time is 15 minutes. Access...
example 2
[0031] The preparation method of aluminum-calcium-barium infrared glass with a protective film is to ultrasonically clean the infrared glass substrate with acetone and ethanol for 15 minutes, put it into the substrate holder, and vacuumize to 3.0×10 -3 Pa, heated to 250°C, and kept warm for 1.5h; Hall ion source was used to clean the aluminum-calcium-barium infrared glass substrate before plating. Prepare the aluminum oxide layer by radio frequency magnetron sputtering Al target, pass Ar into the vacuum chamber, keep the vacuum degree of the chamber at 0.5 Pa, start the glow, carry out backsputter cleaning on the Al target for 18 minutes; pass O 2 , where Ar / O 2 The ratio is 1:1, the indoor vacuum is 2Pa, and the thickness of the obtained aluminum oxide layer is 650nm; the silicon dioxide layer is prepared by radio frequency magnetron sputtering Si target, and Ar is introduced into the vacuum chamber to keep the indoor vacuum at 1Pa. Start-up, carry out back-splash cleaning o...
example 3
[0034] The preparation method of aluminum-calcium-barium infrared glass with a protective film is to ultrasonically clean the infrared glass substrate with acetone and ethanol for 15 minutes, put it into the substrate holder, and vacuumize to 3.0×10 -3 Pa, heated to 280°C, and kept warm for 1.5h; Hall ion source was used to clean the aluminum-calcium-barium infrared glass substrate before plating. Prepare the aluminum oxide layer by radio frequency magnetron sputtering Al target, pass Ar into the vacuum chamber, keep the vacuum degree of the chamber at 1.5Pa, start the glow, carry out backsputter cleaning on the Al target for 20 minutes; pass O 2 , where Ar / O 2 The ratio is 1:2.5, the indoor vacuum is 5Pa, and the thickness of the obtained aluminum oxide layer is 800nm; the silicon dioxide layer is prepared by radio frequency magnetron sputtering Si target, and Ar is introduced into the vacuum chamber to keep the indoor vacuum at 1Pa. Start-up, carry out back-splash cleaning ...
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