Analyzer for metal oxide film

An oxide film and analyzer technology, applied in the direction of material electrochemical variables, etc., can solve the problems of inapplicable large-scale macroscopic detection, small analysis area, and low interlayer resistance, so as to reduce the incidence of poor surface quality problems , good measurement stability and low equipment cost

Active Publication Date: 2016-02-24
武汉钢铁有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Oriented silicon steel is widely used in industry, but in the production of oriented silicon steel, there may be surface quality defects and other adverse problems, such as dew crystals, gold leakage, mottle, low interlayer resistance, etc. Surface quality problems will increase the yield rate of the bottom layer on the one hand, On the other hand, the iron loss is increased, and the image of the product is also damaged
The advantage of these methods is that they can carry out detailed qualitative and quantitative analysis on the composition, morphology and structure of the oxide layer, so they are especially suitable for scientific research, but these analysis methods have long analysis periods, small analysis areas, and high equipment investment and detection costs. , not suitable for long-term, continuous, large-scale macroscopic detection in industrial production

Method used

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  • Analyzer for metal oxide film
  • Analyzer for metal oxide film
  • Analyzer for metal oxide film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] 1. Pour about 3000ml of water into the water tank 11, inject 400ml of sulfuric acid with a concentration of 8% into the acid tank 10, and immerse the acid tank in the water;

[0028] 2. The constant temperature magnetic stirrer 8 is energized, the acid is preheated, the set temperature is 40°C, and the rotation speed of the magnet 9 is 30 rpm;

[0029] 3. Connect the copper guide rod 3 to the potentiometer 1 with the wire 7, the pole plates 4 and 5 are fixed on the copper guide rod 3 by bolts, and the copper guide rod 3 is fixed on the cover plate 2 by bolts;

[0030] 4. The cover plate 2 is covered on the acid tank 10, while the pole plates 4 and 5 are immersed in the acid, and the cover plate 2 is fixed on the acid tank 10 with bolts;

[0031] 5. Turn on the potentiometer 1 to start measurement. When the value displayed on the potentiometer is stable at 0mV, the reaction is completed, and the power is turned off to end the measurement.

Embodiment 2

[0033] 1, inject about 4000ml water in the water tank 11, inject 500ml in the acid tank 10, the concentration is 10% sulfuric acid, and the acid tank 10 is immersed in water;

[0034] 2. The constant temperature magnetic stirrer 8 is energized, the acid is preheated, the set temperature is 40°C, and the rotation speed of the magnet 9 is 40 rpm;

[0035] 3. Connect the copper guide rod 3 to the potentiometer 1 with the wire 7, the pole plates 4 and 5 are fixed on the copper guide rod 3 by bolts, and the copper guide rod 3 is fixed on the cover plate 2 by bolts;

[0036] 4. The cover plate 2 is covered on the acid tank 10, while the pole plates 4 and 5 are immersed in the acid, and the cover plate 2 is fixed on the acid tank 10 with bolts;

[0037] 5. Turn on the potentiometer 1 to start measurement. When the value displayed on the potentiometer is stable at 0mV, the reaction is completed, and the power is turned off to end the measurement.

Embodiment 3

[0039] 1, inject about 4000ml water in the water tank 11, inject 600ml in the acid tank 10, the concentration is 12% sulfuric acid, and the acid tank 10 is immersed in water;

[0040] 2. The constant temperature magnetic stirrer 8 is energized, the acid is preheated, the set temperature is 40°C, and the rotation speed of the magnet 9 is 40 rpm;

[0041] 3. Connect the copper guide rod 3 to the potentiometer 1 with the wire 7, the pole plates 4 and 5 are fixed on the copper guide rod 3 by bolts, and the copper guide rod 3 is fixed on the cover plate 2 by bolts;

[0042] 4. The cover plate 2 is covered on the acid tank 10, while the pole plates 4 and 5 are immersed in the acid, and the cover plate 2 is fixed on the acid tank 10 with bolts;

[0043] 5. Turn on the potentiometer 1 to start measurement. When the value displayed on the potentiometer is stable at 0mV, the reaction is completed, and the power is turned off to end the measurement.

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PUM

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Abstract

The invention aims at solving the problems that a silicon steel plate surface oxide layer is long in detection period and investment cost is high, and provides analysis equipment which is based on a primary battery principle and is capable of performing rapid determination on the metal oxide layer. The analysis equipment comprises a potentiometer, a copper guide rod, a cover plate, an acid tank, a water tank, a constant-temperature magnetic stirrer and a porous baffle plate; the constant-temperature magnetic stirrer controls the electrolyte solution temperature stability and concentration uniformity; the copper guide rod is a specially-prepared connecting guide rod, is fixedly disposed on the multifunctional cover plate and is capable of realizing positioning and adjusting of conduction current and a polar plate; and the porous baffle plate is capable of effectively blocking eddy current and guaranteeing the measure stability. The provided equipment is low in cost, low in measure cost, simple to operate and good in measure stability, and is capable of realizing macroscopic rapid measure on the metal oxide film. A figure (5) is the result graphic representation of the apparatus provided by the invention measuring the oriented silicon steel surface oxide layer.

Description

Technical field: [0001] The invention relates to a material analysis device, in particular to a metal oxide film analyzer. Background technique: [0002] Oriented silicon steel is widely used in industry, but in the production of oriented silicon steel, there may be surface quality defects and other adverse problems, such as dew crystals, gold leakage, mottle, low interlayer resistance, etc. Surface quality problems will increase the yield rate of the bottom layer on the one hand, On the other hand, the iron loss is increased, and the image of the product is also damaged. The quality of the oxide layer formed by decarburization annealing has a decisive impact on the final surface quality, but it takes about several weeks from decarburization annealing to the discovery of surface quality problems after the final coating of the insulating layer, and then to analyzing the problem and finding a solution. A large number of products with poor surface quality will be produced for ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/30
CPCG01N27/30
Inventor 朱业超王仁学周前华骆忠汉程祥威王向欣郭小龙林勇肖光润
Owner 武汉钢铁有限公司
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