The invention discloses a method for monitoring a
ghosting effect of an illumination
system of a photoetching
machine, which comprises the following steps: step 1, the illumination
system comprises a lens and a measurement platform, and a
light intensity uniformity sensor is arranged on the measurement platform; setting a lens area, a
peripheral area and a central area on a moving plane of the measuring platform; light leakage of the
peripheral area can generate a
ghosting effect. Step 2, turning on the illumination
system, moving the measurement platform to move the
light intensity uniformity sensor to the central area, measuring the
first light intensity of the central area, and obtaining a reference value according to the
first light intensity; and step 3, moving the
light intensity uniformity sensor to a selected position of the
peripheral area, and measuring second light intensity at the selected position. And step 4, dividing the second light intensity by the reference value to form a first ratio, and taking the first ratio as a
scattered light monitoring value of the ghost effect. According to the invention, the sensitivity can be improved, the monitoring range can be expanded, the measurement period can be shortened, repeated measurement can be realized, measurement errors can be effectively eliminated, and the accuracy is improved.