Nanoscale optical element surface shape detection supporting tool of deep UV projection photoetching objective lens

Abstract

The invention provides a nanoscale optical element surface shape detection supporting tool of a deep UV projection photoetching objective lens. The nanoscale optical element surface shape detection supporting tool comprises an optical element; eighteen elastic sheet supporting units, which are arranged uniformly by 20degrees; a frame used for fixing the elastic sheet supporting units; three radial digital display micrometer head adjusting devices, which are used for precision adjustment of a lens, and are uniformly arranged by 120degrees; and three V-shaped positioning blocks used for precision repeated positioning of the frame. The nanoscale optical element surface shape detection supporting tool of the deep UV projection photoetching objective lens is especially suitable for the detection supporting tool of the detected optical element during the optical element nanoscale surface shape detection of the deep UV projection photoetching objective lens. The clamping repeated precision is high, and the precision requirement of the surface shape truing during the optical processing can be satisfied.

Description

technical field [0001] The invention belongs to the field of ultra-high-precision surface shape detection of optical elements of deep ultraviolet projection lithography objective lenses, and relates to a nanoscale optical element surface shape detection support tool of deep ultraviolet projection lithography objective lenses. Background technique [0002] As the integration level of integrated circuit devices and the working speed of devices continue to increase, the requirements for the resolution of projection lithography projection objective lenses for manufacturing lithography machines are also continuously increasing. At present, the projection lithography projection objective lens not only applies the large numerical aperture and short wavelength technology, but also applies the wavefront engineering technology to improve the lithography resolution. At present, the deep ultraviolet ArF excimer laser projection lithography equipment with a wavelength of 193.368nm has bec...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of reproducibility of the surface shape detection of nano-scale optical elements of the deep ultraviolet lithography objective lens, the present invention proposes a support for the optical element, which is especially suitable for the detection of the surface shape of the optical element in the deep ultraviolet lithography projection objective lens, based on Nano-scale optical element surface shape detection support tooling for deep ultraviolet projection lithography objective lens with multi-point shrapnel uniform support structure

Images