The sealing structure of the inlet and outlet of the continuous plasma modification device for film strip material

A sealing structure, plasma technology, applied in the direction of engine sealing, engine components, mechanical equipment, etc., can solve problems such as gas sealing problems

Active Publication Date: 2017-05-03
SUZHOU VOCATIONAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The method of adding inert gas can certainly improve the effect of surface modification, but there is also the problem of gas sealing under dynamic state.

Method used

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  • The sealing structure of the inlet and outlet of the continuous plasma modification device for film strip material
  • The sealing structure of the inlet and outlet of the continuous plasma modification device for film strip material
  • The sealing structure of the inlet and outlet of the continuous plasma modification device for film strip material

Examples

Experimental program
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Effect test

Embodiment

[0025] A sealing structure for the inlet and outlet of a continuous plasma modification device with film strips, see attached figure 1 As shown, the film strip material 2 is discharged on the discharge roller 4, passes through several guide rollers 3 in the modification chamber 1, and finally winds up on the take-up roller 13.

[0026] See attached figure 1 ~ attached image 3 As shown, the inlet and outlet are the inlets and outlets of the modified chamber 1 of the plasma modification device, including the feed inlet and the outlet, both of which are located on the modified chamber 1, and the film belt material 2 Enter the modified bin 1 through the feed port, and output from the modified bin 1 through the discharge port. The moving direction of the film strip material 2 is perpendicular to the radial plane of the feed port and the discharge port, along the Observed from the direction of movement, the inlet and outlet are flat.

[0027] Both the feed inlet and the discharg...

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PUM

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Abstract

The invention discloses an inlet / outlet sealing structure of a continuous plasma modification device of a film strip, and an inlet / outlet refers to a modification storehouse inlet / outlet of the plasma modification device. The inlet / outlet sealing structure is characterized in that a feeding hole and a discharge hole are provided with sealing structures relative to the film strip, each sealing structure comprises two magnetofluid modules, the two magnetofluid modules, which are benchmarked against the film strip, are symmetrically distributed at the upper side and the lower side of the film strip for clamping the film strip, each magnetofluid module comprises a magnetic source, a plurality of magnetic poles and a make-up tank, wherein the magnetic source is a permanent magnet or an electromagnetic coil; the magnetic poles are distributed at intervals along the moving direction of the film strip, wherein the main body of each magnetic pole is a sheet magnetizer, a reversed-V shaped cutting edge is arranged at one face of the head of each sheet magnetizer, which faces to the film strip, each reversed-V shaped cutting edge has two flat-straight sections, and every two flat-straight sections and the moving direction of the film strip form acute angles; the make-up tank is used for storing magnetofluid; and the magnetofluid is provided with one conduit correspondingly to each magnetic pole.

Description

technical field [0001] The invention relates to a plasma material modifying device, in particular to an inlet and outlet sealing structure of a continuous plasma material modifying device, which is suitable for the plasma modifying device of flexible strip materials. Background technique [0002] Plasma field material modification has the characteristics of fast response, good improvement effect, and little damage to materials. Especially for fibrous tissue materials, plastic film materials, etc., it has broad application prospects. Conventional plasma field material surface modification is usually required to be carried out in a vacuum state. The material modification under vacuum state can't well meet the requirements of industrial continuous production. With the advancement and development of technology, in recent years, some research and application units have explored the method of adding inert gas in the plasma field to realize the surface modification of plasma fiel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16J15/43
CPCF16J15/43
Inventor 廖黎莉芮晓光张强杨元峰赵敏涯
Owner SUZHOU VOCATIONAL UNIV
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