Color filter and making method thereof and photomask used for making color filter

Abstract

The invention discloses a color filter and a making method thereof and a photomask used for making the color filter. The color filter comprises a substrate, a first color filter film, a second color filter film and a third color filter film, wherein the first color filter film, the second color filter film and the third color filter film are formed on the substrate, the first color filter film comprises a first color-resisting pattern which is patterned, the second color filter film comprises a second color-resisting pattern which is patterned, the third color filter film comprises a third color-resisting pattern which is patterned, the edges on the four sides of each color-resisting pattern form a black matrix by means of overlapping of two kinds of color resistance, and the four corners of each color-resisting pattern form a spacer by means of overlapping of three kinds of color resistance. The filter films in three colors are formed through the same photomask, and the required black matrix and spacer are formed by means of interlapping of the filter films in three colors, so that the making process of the color filter is simplified, making time for the color filter is greatly shortened, and production cost is greatly reduced.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a color filter, a manufacturing method thereof, and a photomask for manufacturing the color filter. Background technique [0002] The liquid crystal display device includes an opposing color filter (ColorFilter, CF) and an array substrate (TFTarray), and a liquid crystal layer (Liquid Crystal, LC) sandwiched between them. The basic structure of the existing color filter includes glass substrate (GlassSubstrate), black matrix (BlackMatrix, BM), color filter film (ColorLayer), electrode layer (ITO), alignment film (Polyimide, PI), spacer ( PhotoSpacer, PS) and other components. [0003] figure 1 It is a partial cross-sectional schematic diagram of an existing color filter, please refer to figure 1 , the black matrix 12 of the color filter 10 is disposed on the glass substrate 11, the black matrix 12 includes a plurality of intersecting light-shielding strips 12a, and the black ...

AI Technical Summary

Problems solved by technology

The industry once proposed the idea of ​​overlapping two color-resist materials to achieve black matrix light shielding when making the color filter film 13, which can save the process of making the black matrix 12, reduce a mask and production process for making the black matrix 12. The process time of the black matrix 12, but the production of the color filter film 13 and the spacer 15 still needs multiple photomasks to complete, the production cost is still high, and the process technology needs to be improved

Images