Neutral transmittance color double-silver low radiation glass and preparation method thereof

A low-emissivity glass and neutral technology, applied in the direction of coating, etc., can solve complex and difficult to see through color problems, and achieve the effect of low shading coefficient

Inactive Publication Date: 2016-07-06
BEIJING JINJING WISDOM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the current film structure of the double-silver Low-E glass layer is very complicated. While ensuring its excellent optical performance, processing performance and appearance color, it is difficult to achieve the neutrality of its transmitted color, and considerable technological breakthroughs are still needed.

Method used

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  • Neutral transmittance color double-silver low radiation glass and preparation method thereof
  • Neutral transmittance color double-silver low radiation glass and preparation method thereof
  • Neutral transmittance color double-silver low radiation glass and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The thickness of the glass substrate (100) is 4mm, the thickness of the first metal oxide layer 101 is 37.0nm, the thickness of the first oxide layer 102 is 29.0nm, the thickness of the first metal titanium layer 103 is 1.1nm, the thickness of the first metal silver Layer 104 has a thickness of 11.0 nm, the second oxide layer 105 has a thickness of 47.0 nm, the second metal oxide layer 106 has a thickness of 60.0 nm, the second metal silver layer 107 has a thickness of 9.2 nm, and the second metal titanium layer 108 has a thickness of 1.1 nm. , The third oxide layer 109 has a thickness of 30.0 nm, the third metal oxide layer 110 has a thickness of 43.0 nm, and the oxidation protection layer 111 has a thickness of 2.3 nm. The specific operation steps are as follows:

[0027] 1) Clean the glass substrate (100) with a size of 4mm, and set the vacuum degree of the off-line magnetron sputtering equipment at 10 -3 Pa, the line speed is set to 4.0m / min;

[0028] 2) transfer ...

Embodiment 2

[0043] 1) Clean the glass substrate (100) with a size of 6mm, and set the vacuum degree of the off-line magnetron sputtering equipment at 10 -3 Pa, the line speed is set to 3~4m / min;

[0044] 2) transfer the glass substrate into the coating chamber, set the total power of the equipment for coating the first metal oxide layer (101) to 157.0KW, and coat the first layer of oxide layer (101) on the glass substrate with a thickness of 36.0nm;

[0045] 3) The total power of the equipment for plating the first oxide layer (102) is set to 80kW, and the first layer of metal oxide (102) is plated on the glass substrate with a thickness of 25.0nm;

[0046] 4) The total power of the equipment for plating the first metal titanium layer (103) is set to 7.2kW, and the first layer of metal titanium (103) is plated on the glass substrate with a thickness of 0.9nm;

[0047] 5) Set the total power of the equipment for plating the first layer of metallic silver (104) to 9.0kW, and plate the firs...

Embodiment 3

[0059] 1) Clean the glass substrate (100) with a size of 6mm, and set the vacuum degree of the off-line magnetron sputtering equipment at 10 -3 Pa, the line speed is set to 3~4m / min;

[0060] 2) transfer the glass substrate into the coating chamber, set the total power of the equipment for coating the first metal oxide layer (101) to 165.0KW, and coat the first layer of oxide layer (101) 42.0nm on the glass substrate;

[0061] 3) The total power of the equipment for plating the first oxide layer (102) is set to 90kW, and the first layer of metal oxide (102) is plated on the glass substrate with a thickness of 30.0nm;

[0062] 4) The total power of the equipment for plating the first metal titanium layer (103) is set to 8.2kW, and the first layer of metal titanium (103) is plated on the glass substrate with a thickness of 1.5nm;

[0063] 5) Set the total power of the equipment for plating the first layer of metallic silver (104) to 9.5kW, and plate the first layer of metallic ...

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Abstract

The invention provides neutral transmittance color double-silver low radiation glass and a preparation method thereof through special design. On one surface of a float glass substrate, a multilayer thin film is deposited in a magnetron sputtering coating manner and has the following structure comprising: a first metal oxide layer (101), a first oxide layer (102), a first metal titanium (103), a first silver layer (104), a second oxide layer (105), a second metal oxide layer (106), a second silver layer (107), a second metal titanium (108), a third oxide layer (109), a third metal oxide layer (110) and a titanium oxide protective layer (111). The double-silver low radiation glass has low shading coefficient and stable optical performance and can be processed in later process, has neutral transmittance color and is an excellent selection for high-grade building glass.

Description

【Technical field】 [0001] The invention relates to the technical field of coated glass, in particular to a double-silver low-emissivity coated glass that can be tempered and has neutral color transmission. 【Background technique】 [0002] Low-emissivity (Low-E) glass is a type of coated glass. By coating the surface of the float glass substrate with a low-emissivity functional film, the emissivity of the glass surface is reduced to improve the energy-saving performance of the glass. Low-emissivity coated glass can block the secondary radiant heat emitted by objects exposed to the sun in summer, and can also reduce the loss of indoor heat in winter, so as to achieve the purpose of heat insulation, energy saving and consumption reduction. Low-emissivity glass is known as the most ideal architectural glass material in the 21st century for its excellent energy-saving and environmental protection performance. With the continuous improvement of decorative requirements for building...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36
CPCC03C17/36C03C17/3618C03C17/3639C03C17/3652C03C17/366C03C17/3681C03C2218/156
Inventor 穆希季亚林唐昊天吴琼宇
Owner BEIJING JINJING WISDOM CO LTD
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