An optical measurement device and method for uniform strain based on double-mirror reflection
A uniform strain, optical measurement technology, used in measurement devices, optical devices, scientific instruments, etc., can solve the problems of harsh isolation conditions and measurement environment applications, hindering sample surface deformation, interference from out-of-plane displacement, etc. The measurement results are more realistic and reliable, the measurement results are stable, and the effect of eliminating the out-of-plane displacement
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[0029] Below in conjunction with accompanying drawing, technical scheme of the present invention is described in further detail:
[0030] Such as figure 1 and figure 2 As shown, a kind of uniform strain optical measurement device based on double-mirror reflection of the present invention includes a camera 1 provided with a lens, an aperture adjustment device and a focus adjustment device, a first reflector 2, a second reflector 3, a sample to be measured 4 and computer 5. The side surface of the tested sample 4 is opposite to the lens of the camera 1, and the front and rear surfaces 401 and 402 of the tested sample 4 are parallel to each other, and both are parallel to the optical axis of the camera 1; The first measured surface 401 is opposite to the first measured surface 401 at an angle of about 45 degrees, and one end of the first reflector 2 away from the camera 1 is closer to the measured sample 4; the second reflector 3 and the measured The second measured surface 4...
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