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A kind of high solid content nanometer spherical silica polishing film and preparation method thereof

A spherical silica, high solid content technology, used in manufacturing tools, metal processing equipment, abrasives, etc., can solve problems such as unspecified modification treatment

Active Publication Date: 2017-08-29
QUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The making of traditional polishing film adopts resin binder such as: the Chinese patent application whose publication number is CN 1012252281A discloses a kind of polishing film and its preparation method, mentions organic silicon resin in this patent, but does not illustrate modification treatment, And it uses micropowder mixed resin

Method used

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  • A kind of high solid content nanometer spherical silica polishing film and preparation method thereof
  • A kind of high solid content nanometer spherical silica polishing film and preparation method thereof
  • A kind of high solid content nanometer spherical silica polishing film and preparation method thereof

Examples

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Effect test

Embodiment 1

[0020] Tetraethyl orthosilicate (TEOS) is used as raw material, ammonia water is used as catalyst, and ethanol is used as co-solvent. First, weigh 225ml of absolute ethanol, 150ml of ammonia water and 30ml of ultrapure water respectively, stir gently with a magnetic stirrer for 15min in a three-necked flask and mix evenly, then quickly add 17.5ml of TEOS into the above reaction solution, stir at 60°C for 2h, and then Centrifuge, wash with water and ethanol for 5 times, and finally dry in vacuum at 110° C. for 24 hours, and grind to obtain silica nanoparticles.

[0021] Dry the silica nanoparticles prepared above in a vacuum oven at 100°C for 24 hours, then weigh 55 g of the dry powder and place it in a single-necked flask, and add 30 g of cyclohexane, y-methacryloyloxypropyl trimethyl Oxysilane 7.5g, n-propylamine 7.5g, the obtained mixture was dispersed by ultrasonic vibration for 10min, stirred at 25°C for 30min, then placed in a rotary evaporator and evaporated for 10min un...

Embodiment 2

[0028] Tetraethyl orthosilicate (TEOS) is used as raw material, ammonia water is used as catalyst, and ethanol is used as co-solvent. First, weigh 225ml of absolute ethanol, 150ml of ammonia water and 30ml of ultrapure water respectively, stir gently with a magnetic stirrer for 15min in a three-necked flask and mix evenly, then quickly add 17.5ml of TEOS into the above reaction solution, stir at 60°C for 2h, and then Centrifuge, wash with water and ethanol for 5 times, and finally dry in vacuum at 110° C. for 24 hours, and grind to obtain silica nanoparticles.

[0029] Dry the silica nanoparticles prepared above in a vacuum oven at 100°C for 24 hours, then weigh 55 g of the dry powder and place it in a single-necked flask, and add 30 g of cyclohexane, y-methacryloyloxypropyl trimethyl Oxysilane 7.5g, n-propylamine 7.5g, the obtained mixture was dispersed by ultrasonic vibration for 10min, stirred at 25°C for 30min, then placed in a rotary evaporator and evaporated for 10min un...

Embodiment 3

[0033] Tetraethyl orthosilicate (TEOS) is used as raw material, ammonia water is used as catalyst, and ethanol is used as co-solvent. First, weigh 225ml of absolute ethanol, 150ml of ammonia water and 30ml of ultrapure water respectively, stir gently with a magnetic stirrer for 15min in a three-necked flask and mix evenly, then quickly add 17.5ml of TEOS into the above reaction solution, stir at 60°C for 2h, and then Centrifuge, wash with water and ethanol for 5 times, and finally dry in vacuum at 110° C. for 24 hours, and grind to obtain silica nanoparticles.

[0034] Dry the silica nanoparticles prepared above in a vacuum oven at 100°C for 24 hours, then weigh 55 g of the dry powder and place it in a single-necked flask, and add 30 g of cyclohexane, y-methacryloyloxypropyl trimethyl Oxysilane 7.5g, n-propylamine 7.5g, the obtained mixture was dispersed by ultrasonic vibration for 10min, stirred at 25°C for 30min, then placed in a rotary evaporator and evaporated for 10min un...

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Abstract

The invention relates to a high-solid-content nano spherical silicon dioxide composite resin polishing film and a preparing method thereof. The preparing process comprises the following steps that firstly, tetraethoxysilane is subjected to hydrolysis, nanosilicon dioxide powder is obtained through drying, nanosilicon dioxide is subjected to surface modification, and modified inorganic powder is obtained; secondly, resin mixed liquor is obtained through mixing of a resin matrix, a diluent and a photoinitiator; thirdly, surface pretreatment is conducted on the surface of a PET film substrate; fourthly, the PET film subjected to surface pretreatment is coated with the resin mixed liquor, and primer is obtained through drying and photocuring; fifthly, the modified inorganic powder is added into the resin mixed liquor, and coating liquor is obtained; and sixthly, the PET film obtained after primer treatment in the fourth step is coated with the coating liquor, and the nanosilicon dioxide polishing film is obtained through drying and photocuring. The silicon dioxide solid content of a coating layer of the nanosilicon dioxide polishing film prepared through the method reaches 40 wt.% to 70 wt.%, and meanwhile the nanosilicon dioxide polishing film has the beneficial effects of being high in polishing quality and even in particle distribution.

Description

technical field [0001] The invention belongs to the field of precision machining grinding and polishing, and relates to a high-solid-content nano-scale silicon dioxide polishing film and a preparation method thereof. Background technique [0002] Optical fiber connectors, as one of the most important optical passive components that make up optical fiber systems, require lower insertion loss and higher return loss in terms of performance to improve the reliability of optical fiber transmission systems. To evaluate the quality of optical fiber connectors, it is necessary to measure the surface quality of the end face of the connector ferrule body after grinding and polishing. Only by keeping the surface quality within a certain range can the optical fiber maintain good communication quality; in addition, try to remove the degenerated layer on the end face of the optical fiber, and test whether there are scratches or other contamination on the end face of the optical fiber. Fi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24D11/00B24D11/02B24D11/08
CPCB24D11/00B24D11/001B24D11/02B24D11/08
Inventor 周兆忠石宝民冯凯萍朱跃恋郁炜尹涛倪成员许庆华
Owner QUZHOU UNIV