A mask-based projection objective lens performance testing device and method

A technology of projection objective lens and testing device, which is applied in testing optical performance, exposure device of photo-plate making process, photography, etc. It can solve the problems of uncertain actual optical axis of objective lens and unusability, so as to reduce the difficulty of splicing, reduce requirements, and increase feasibility sexual effect

Active Publication Date: 2018-12-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, this method needs to adjust the optical axis of the measuring device and the objective lens to be parallel in advance.
But for the objective lens with adjustable image plane position, the actual optical axis of the objective lens is uncertain, so this method cannot be used

Method used

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  • A mask-based projection objective lens performance testing device and method
  • A mask-based projection objective lens performance testing device and method
  • A mask-based projection objective lens performance testing device and method

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Embodiment Construction

[0044] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0045] The present invention provides a mask-based projection objective lens performance test device and a test method, which can achieve the following three improvements compared with the current testing technology: 1) It can determine whether the object image plane of the objective lens is ideal in spatial position Conjugate, and can test to obtain the deviation; 2) Since the reference measurement is used, the influence of the mask surface shape, mark processing and manufacturing errors, standard wavefront errors, and inherent systematic errors in the measurement components on the measurement accuracy can be eliminated , so the measurement accuracy of the basic performance of the objective lens has been improved; 3) To measure the absolute telecentricity of the objective lens, the measurement method is simple and the accuracy is high.

[004...

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Abstract

The invention discloses a performance test device for a projection objective lens based on a mask plate. The test device comprises a mask platform assembly, a mask platform aligning assembly and a mark detection assembly, wherein a mark array of the mask plate is imaged by the projection objective lens to form mark image points via the mask platform assembly, the mask platform aligning assembly is used to align and install the mask platform assembly, and the mark detection assembly is used to measure the mark array and mark image points of the mask plate to obtain wavefront information of the projection objective lens.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a test and calibration platform applied to projection objective lenses. Background technique [0002] With the rapid development of the semiconductor industry, the market demand for more refined and large-capacity lithography machine products is becoming more and more urgent. One of the effective ways to increase the productivity of lithography machines is to expand the exposure field of view. However, limited by the size of the high-uniformity glass material, a single objective lens cannot infinitely expand the exposure field of view under the premise of high-precision imaging. The splicing objective lens can solve this problem very well. Among them, there is a splicing objective lens composed of multiple +1X sub-objective lenses (groups), which can theoretically achieve infinite expansion of the field of view. But before splicing, each sub-objective ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G03F9/00G03F7/20
Inventor 李天鹏何经雷
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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