Diamond double-side brush-washing machine

Abstract

The invention discloses a diamond double-side brush-washing machine. The diamond double-side brush-washing machine comprises a protective cover and a worktable mounted in the protective cover, as well as a feeding device, a plurality of sets of double-side brushing devices and a discharging device which are sequentially arranged from one end of the worktable to the other end, wherein pick-up devices are arranged between the feeding device and the double-side brushing devices, between every two adjacent sets of the double-side brushing devices, and between the double-side brushing devices and the discharging device; and limiting components are further arranged at the positions corresponding to the double-side brushing devices. According to the diamond double-side brush-washing machine, the double-side brushing devices are adopted to clean the upper sides and the lower sides of sapphire substrates, the process is simple and the operation is convenient; the pick-up devices are utilized to reduce the scratch probability of the sapphire substrates, so that the yield of the sapphire substrates is improved; and the limiting components are adopted to control the cleaning time of the sapphire substrates on the double-side brushing devices according to actual demands so as to guarantee the cleaning effect of the sapphire substrates.

Description

technical field [0001] The invention relates to the field of sapphire processing, in particular to a square chip double-sided scrubbing machine. Background technique [0002] Sapphire has a wide optical penetration and has good light transmission from near ultraviolet light to mid-infrared light. Therefore, it is used as a graphic substrate and is widely used in optical components, infrared devices, high-strength laser lens materials and photomask materials. superior. Graphical substrate is a newly developed technology based on the principle of light extraction. It designs and manufactures nano-scale specific microstructure patterns on sapphire substrates in the form of growth or time, so as to control the output light form of LEDs and reduce the The dislocation defects between GaN grown on sapphire improve the quality of epitaxy, and replace the internal quantum efficiency of LED to increase the light extraction efficiency. Now many epitaxy factories have adopted this tec...

AI Technical Summary

Problems solved by technology

[0003] The current sapphire cleaning method is as follows: on the sheet, after the suction cup absorbs the sapphire substrate, put it into the cleaning tank in turn, and the cleaning brush corresponding to the cleaning tank scrubs the surface of the sapphire substrate, and enters the next cleaning tank after the brushing is completed. After cleaning, it is necessary to replace the cleaning solution and turn over the sapphire substrate, repeat the above process to clean the other side of the sapphire substrate, the process is more complicated, and the sapphire substrate is easy to be scratched during the cleaning process

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