Double-station exposure method

An exposure method and a double-station technology, which are applied in photolithography exposure devices, microlithography exposure equipment, optics, etc., can solve problems affecting production line production efficiency, and achieve the effect of improving production efficiency and simple operation methods

Active Publication Date: 2016-09-28
江西威力固智能设备有限公司
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  • Claims
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AI Technical Summary

Problems solved by technology

[0004] However, in order to ensure the exposure quality in the related art, the exposure method adopted is single-station exposure, because the time for transferring the plate to be exposed is much shorter than the exposure time, therefore, there is a waiting time for each plate to be exposed, which seriously affects production line productivity

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Embodiment Construction

[0023] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0024] Please also see figure 1 and figure 2 ,in, figure 1 It is a partial structural schematic diagram of the double-station exposure production line provided in the double-station exposure method of the present invention; figure 2 It is a flow chart of the dual-station exposure method of the present invention. The invention provides a double-station exposure method, comprising the following steps:

[0025] Step S1, providing a double-station exposure production line 100, including:

[0026] The first station 11 and the second station 21 for realizing the exposure process;

[0027] The first suction cup 12 and the second suction cup 22 cooperating with the first station 11 and the second station 21, the first station 11 and the second station 21 are exposed along the double station The flow direction of the production line 100 is arranged side ...

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Abstract

The invention discloses a double-station exposure method, which comprises the steps of: providing a double-station exposure production line; detecting stations; conveying plates; carrying out exposure; and transferring the plates, wherein the double-station exposure production line comprises a first station, a second station, a first suction cup and a second suction cup; the first suction cup sequentially absorbs the plates to transfer to the first station and the second station respectively; after the plates at the first station are exposed, the second suction cup absorbs the exposed plates at the first station to transfer to the next station and the first suction cup supplements to-be-exposed plates to the first station; and after the second station is exposed, the second suction cup absorbs the exposed plates at the second station to transfer to the next station and the first suction cup supplements the to-be-exposed plates to the second station. Compared with a related technology, the double-station exposure method disclosed by the invention is simple to operate and the production efficiency is high.

Description

technical field [0001] The invention relates to the technical field of printed circuit board production, in particular to a double-station exposure method in the exposure process. Background technique [0002] Exposure is a very important process link in the field of printed circuit boards. Exposure means that under the irradiation of ultraviolet light, the photoinitiator absorbs the light energy and decomposes into free radicals, which then trigger the photopolymerizable monomers to undergo polymerization and crosslinking reactions. Form a large macromolecular structure that is insoluble in dilute alkali solution. Among them, the photosensitive resist that undergoes polymerization and cross-linking reaction will protect the circuit pattern from being etched during the subsequent etching process, while the non-photosensitive resist will not undergo polymerization and cross-linking reaction, and will be exposed to dilute alkali solution when developing in the subsequent proce...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H05K3/00
CPCG03F7/70733H05K3/00
Inventor 周勇张志鹏蔡志浩袁永仪刘华珠赵晓芳
Owner 江西威力固智能设备有限公司
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