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Sequential ICP optical emission spectrometer and method for correcting measurement wavelength

An analysis device and wavelength technology, which is applied in thermal excitation analysis, material excitation analysis, spectrum investigation, etc., can solve the problems of increased cost, huge workload, and excessive constraints on device improvement, so as to improve detection accuracy and suppress Cost, improvement of equipment is easy

Active Publication Date: 2016-10-12
HITACHI HIGH TECH SCI CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, every time the configuration conditions are changed, it is necessary to conduct confirmation experiments, etc., and the workload is huge, which becomes an excessive constraint on device improvement.
[0010] The technology of Patent Document 2 is limited to a multi-wavelength ICP emission spectrometer
In addition, adjustment of the angle and position of optical elements such as telemetry mirrors requires mechanisms such as actuators, which will lead to increased costs, etc.

Method used

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  • Sequential ICP optical emission spectrometer and method for correcting measurement wavelength
  • Sequential ICP optical emission spectrometer and method for correcting measurement wavelength
  • Sequential ICP optical emission spectrometer and method for correcting measurement wavelength

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Embodiment Construction

[0024] Below, according to figure 1 , figure 2 Preferred embodiments of the sequential ICP (Inductively Coupled Plasma) emission spectrometer and measurement wavelength correction method of the present invention will be described in detail.

[0025] figure 1 It is a conceptual diagram showing an embodiment of a sequential ICP emission spectrometer A. The sequential ICP emission spectrometer A includes a spectrometer 20 and a control unit 40 in addition to an inductively coupled plasma generator 10 for exciting an element to be measured.

[0026] The inductively coupled plasma generator 10 is roughly composed of a spray chamber 11 , a nebulizer 12 , a plasma torch 13 , a high-frequency induction coil 14 , a gas control unit 15 , and a high-frequency power supply 16 .

[0027] The spectroscope 20 has an incident window 21 , optical components 22 such as a diffraction grating and a concave mirror, and a detector (detection unit) 24 . The optical component 22 includes a diffr...

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Abstract

The present disclosure provides a sequential inductively coupled plasma (ICP) optical emission spectrometer and a method for correcting measurement wavelength, which does not require a mechanism for mechanically moving a detector of a spectroscope or a temperature control mechanism of an optical splitter. The ICP optical emission spectrometer operates to perform based on a shift amount (time dependency) of a wavelength peak position according to time elapse of a reference wavelength obtained as a result of continuously measuring a plurality of emission lines of argon having different wavelengths as the reference wavelength and a per-wavelength shift amount (wavelength dependency) of the reference wavelength. A controller (40) calculates a correction amount of a diffracting grating (22a) as which a shift amount of a wavelength peak of each measured wavelength which is set when detection lines of a detected object element are generated relative to the initial position, and performs measurement wavelength correction for correcting the movement position of the diffracting grating (22a) corresponding to the wavelength peak position of the measurement wavelength relative to the initial position.

Description

technical field [0001] The present invention relates to a sequential ICP emission spectroscopic analysis device and a measurement wavelength correction method for introducing a sample into an inductively coupled plasma (ICP) and performing qualitative / quantitative analysis of elements contained in the sample. Background technique [0002] An ICP emission spectrometer is used for qualitative / quantitative analysis of elements contained in a sample. In the ICP emission spectrometer, a spectrometer is used that introduces gas such as argon and a sample solution into a plasma torch, generates plasma by applying high frequency, and splits the generated plasma light. [0003] The plasma light is split into wavelengths specific to the element by a spectrometer, and the emission intensity at the wavelength is measured by a detector. In order to suppress the drift (drift) of the peak position that may occur due to changes in the diffraction conditions corresponding to temperature cha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/73
CPCG01N21/73G01J3/28
Inventor 一宫丰
Owner HITACHI HIGH TECH SCI CORP