Sequential ICP optical emission spectrometer and method for correcting measurement wavelength
An analysis device and wavelength technology, which is applied in thermal excitation analysis, material excitation analysis, spectrum investigation, etc., can solve the problems of increased cost, huge workload, and excessive constraints on device improvement, so as to improve detection accuracy and suppress Cost, improvement of equipment is easy
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[0024] Below, according to figure 1 , figure 2 Preferred embodiments of the sequential ICP (Inductively Coupled Plasma) emission spectrometer and measurement wavelength correction method of the present invention will be described in detail.
[0025] figure 1 It is a conceptual diagram showing an embodiment of a sequential ICP emission spectrometer A. The sequential ICP emission spectrometer A includes a spectrometer 20 and a control unit 40 in addition to an inductively coupled plasma generator 10 for exciting an element to be measured.
[0026] The inductively coupled plasma generator 10 is roughly composed of a spray chamber 11 , a nebulizer 12 , a plasma torch 13 , a high-frequency induction coil 14 , a gas control unit 15 , and a high-frequency power supply 16 .
[0027] The spectroscope 20 has an incident window 21 , optical components 22 such as a diffraction grating and a concave mirror, and a detector (detection unit) 24 . The optical component 22 includes a diffr...
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