A nanoparticle atomic layer deposition device and method based on space isolation

Abstract

The invention discloses a nano-particle atomic layer deposition device and method based on spatial isolation. Nano-particles to be wrapped pass through a pipeline provided with a plurality of electrodes along with airflow, and due to the fact that the nano-particles take the same charge when passing through the electrodes through the point discharge effect, the nano-particles are mutually repulsed and prevented from gathering, and the purpose of dispersing the nano-particles is achieved; and afterwards, the nano-particles are evenly wrapped after passing through a cleaning area or a precursor reaction area. The spatial isolation principle is adopted, different courses of atomic layer deposition are not affected mutually, the nano-particles can be quickly and evenly wrapped at the normal pressure, and the wrapping rate and evenness of deposited films and powder surface wrapping efficiency are improved.

Description

technical field [0001] The invention belongs to the technical field of atomic layer deposition, and more specifically, relates to a nanoparticle atomic layer deposition device and method based on space isolation. Background technique [0002] Powder particles have a series of excellent chemical and physical properties at the microscopic level, but at the same time, they also show disadvantages such as easy agglomeration, oxidation and unstable properties. By coating the surface of the powder particles with a protective film, the above shortcomings can be effectively overcome, and the powder particles with a protective film can also be used as a new composite material with excellent performance. [0003] At present, the coating methods of powder particles mainly include solid-phase method, liquid-phase method and gas-phase method. As a special chemical vapor deposition technology, atomic layer deposition technology has excellent uniformity and reliability compared with other ...

AI Technical Summary

Problems solved by technology

[0004] The conventional atomic layer deposition method can be directly applied to the surface of the substrate, and can obtain a good coating effect. However, for nanoparticles with a very large specific surface area, the conventional atomic layer deposition method is used for coating, and there is a phenomenon of particle agglomeration. A very serious problem that directly damages the coating rate and uniformity of the particle surface, limiting the further utilization of nanoparticles in industry

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