Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Anti-reflection coating for ultra-wide-angle hemispherical lens and coating method thereof

A technology of hemispherical lens and anti-reflection coating, which is applied in the field of ultra-wide-angle hemispherical lens anti-reflection coating and its coating. It can solve the problems of uneven thickness of the center and edge of the lens, and the inability of the anti-reflection coating to achieve anti-reflection, so as to reduce reflection. efficiency, eliminate the risk of film cracking, and solve the effect of stress on the film layer

Active Publication Date: 2018-07-13
SANMING FOCTEK PHOTONICS INC
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides an anti-reflection coating for an ultra-wide-angle hemispherical lens and a coating method thereof. The invention selects SiO 2 、TiO 2 , and MgF 2 As a coating material, an anti-reflection film is coated on the lens body, which solves the problem that the anti-reflection film cannot play an anti-reflection role due to the uneven thickness of the center and edge of the lens.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Anti-reflection coating for ultra-wide-angle hemispherical lens and coating method thereof
  • Anti-reflection coating for ultra-wide-angle hemispherical lens and coating method thereof
  • Anti-reflection coating for ultra-wide-angle hemispherical lens and coating method thereof

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment

[0044] An anti-reflection coating for an ultra-wide-angle hemispherical lens, the anti-reflection coating 2 is composed of 13 layers of coatings coated on the lens body 1, wherein the 13 layers of coatings are in order from near to far from the lens body: First SiO 2 Film layer 21, the first TiO 2 Film layer 22, the second SiO 2 Film layer 23, the second TiO 2 Film layer 24, the third SiO 2 Film layer 25, the third TiO 2 Film layer 26, the fourth SiO 2 Film layer 27, the fourth TiO 2 Film layer 28, the fifth SiO 2 Film layer 29, the fifth TiO 2 Film layer 210, the sixth SiO 2 Film layer 211, the sixth TiO 2 Film layer 212 and MgF 2 film layer 213 .

[0045] The 13 film layers of the present invention are the minimum number of layers to achieve the effect of the present invention, but the thickness is difficult to control if the number of layers is too many, and it is not convenient for batch production.

[0046] The first SiO 2 The thickness of the film layer 21 i...

Embodiment 1

[0062] like figure 1 , the super wide-angle hemispherical lens has a convex surface curvature of 15.75mm, an aperture of 28.8mm, spectral index requirements: Rabs<0.5%@420-700, and the lens base material is ZF13.

[0063] A method for preparing an antireflection coating for an ultra-wide-angle hemispherical lens, comprising the following steps:

[0064] (1) Taking a conventional lens as an example, regardless of the film thickness difference between the edge and the center, pre-deposit a conventional visible light anti-reflection coating, and confirm the film thickness ratio between the center and edge of the lens. Choose TiO 2 and SiO 2 Reflectance spectra designed as coating materials such as image 3 As shown, the 420-700nm reflectance is less than 0.5%.

[0065] Each film layer is in order from near to far from the glass substrate: the first layer, TiO with a thickness of 17.1nm 2 Film layer; 2nd layer, SiO with a thickness of 24.5nm 2 Film layer; the third layer, Ti...

Embodiment 2

[0069] Choose TiO 2 , SiO 2 , MgF 2 As a coating material, the coating index confirmed according to step 3 is R figure 2 As shown, the first layer, the first SiO with a thickness of 21nm2 Film layer; the second layer, the first TiO with a thickness of 12.1 nm 2 Film layer; the third layer, SiO with a thickness of the second 53.5nm 2 Film layer; the fourth layer, the second TiO with a thickness of 8.0nm 2 Film layer; the fifth layer, the third SiO with a thickness of 217.4nm 2 Film layer; the sixth layer, the third TiO with a thickness of 13.1nm 2 Film layer; the seventh layer, the fourth SiO with a thickness of 40.6nm 2 Film layer; the 8th layer, the fourth TiO with a thickness of 36nm 2 Film layer; the ninth layer, the fifth SiO with a thickness of 11.4nm 2 ; the 10th layer, the fifth TiO with a thickness of 78.6nm 2 Film layer: the 11th layer, the sixth SiO with a thickness of 23.2nm 2 Film layer: the 12th layer, the sixth SiO with a thickness of 23.9nm 2 Film laye...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to an ultrawide-angle hemispherical lens antireflection film and a coating method thereof. The spectral range of the antireflection film is broadened from the perspective of the design of the film system by changing the conventional design thought so that the thin position of the edge film layer is enabled to still achieve the antireflection effect. The film thickness within the same circumference of a lens is ensured to be uniform only by controlling the deposition rate of the film material layer and the revolution speed of a workpiece disc without modifying conventional equipment. The adhesion and the compactness of the film layer are enhanced by adopting the film coating technology of ion source etching and ion source auxiliary deposition. According to the design, the film layer close to a substrate uses TiO2 and SiO2 and the ion source is additionally arranged for assistance so that the stress problem of the TiO2 and MgF2 film layers can be effectively solved and the risk of film cracking can be eliminated; and the outermost layer uses low-refractivity MgF2 so that the reflectivity of the whole bandwidth can be reduced to the largest extent, the bandwidth can be broadened and the low reflectivity can be guaranteed, and the film layer stress can be reduced and the risk of film cracking can be reduced.

Description

technical field [0001] The invention relates to an anti-reflection coating for an ultra-wide-angle hemispherical lens and a coating method thereof, in particular to an anti-reflection coating for a lens whose curvature is equivalent to the caliber and a coating method thereof. Background technique [0002] Optical thin films are indispensable devices in modern optical systems and play a pivotal role in optical instruments. With the development of optical products, the application of optical lenses is becoming wider and wider. For high-definition, wide-angle, and star-level lenses, they are all developing in the direction of large numerical aperture and large amount of light, so the coating of the lens is very important. In the coating process, due to the difference in the deposition angle of the film material vapor generated by the point source, there are certain differences in the film thickness of each point on the same lens surface. The effect on the lens with a small cu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/115C23C14/30C23C14/08C23C14/10C23C14/06C23C14/02
CPCC23C14/022C23C14/0694C23C14/085C23C14/10C23C14/30G02B1/115
Inventor 吴小春
Owner SANMING FOCTEK PHOTONICS INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products