Topical antifungal composition for treating onychomycosis

A composition and application technology, applied in the direction of antifungal agent, drug combination, manicure, etc., to achieve the effect of environmentally friendly manufacturing process, improvement of evaporation time, and reduction of treatment cost

Inactive Publication Date: 2016-11-09
POLICHEM SA
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage is that this composition requires penetration enhancers and plasticizers, which flocculate at temperatures below 15°C, and transport and storage require specific temperatures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Topical antifungal composition for treating onychomycosis
  • Topical antifungal composition for treating onychomycosis
  • Topical antifungal composition for treating onychomycosis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Batches P-14-004, P-14-014, P-14-015, P-14-016 and P-14-017 were prepared according to the teachings of the present invention with the following w / w % compositions:

[0039]

[0040] The formulations are prepared by mixing the ingredients in a suitable sealed container with a stirrer. The resulting mixture was stirred until dissolved.

Embodiment 2

[0041] Embodiment 2 (comparative)

[0042] Batches P-14-003, P-14-002, P-14-001 were prepared according to the disclosure of WO02 / 07683A1 with the following w / w% composition:

[0043]

[0044] preparation

[0045] The formulations are prepared by using suitable sealed containers with agitators. To this vessel was added ethanol, ethyl acetate, cetearyl alcohol, cyclopirox and water to form a homogeneous mixture. Then, hydroxypropyl chitosan was added, and the resulting mixture was stirred until dissolved.

Embodiment 3

[0047] The formulations prepared according to Example 1 (lots P-14-004, P-14-014, P-14-015, P-14-016 and P-14-017) and the formulations prepared according to Example 2 ( Batch P-14-001 and Batch P-14-003) were stored at the indicated temperature (5°C and 25°C) for at least 1 hour.

[0048] Photographs of the samples were taken before and after exposure times at various temperatures to assess the appearance of the solutions and reported at Figures 1 to 7 middle. The observations are summarized in Table 1.

[0049] Table 1:

[0050]

[0051]

[0052] It can be easily understood that the solutions prepared according to the teachings of the present invention (lots P-14-004, P-14-014 and P-14-015) are superior to those prepared according to WO02 / Solution prepared from the disclosure of 07683A1 (Lot P-14-003), as no white flocs were observed. The absence of white floe allows formulations prepared according to the teachings of the present invention to be shipped during ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention is directed to a nail lacquer consisting essentially of ciclopirox as an antimycotic agent, hydroxypropyl chitosan as film forming agent, water and a lower alkanol as solvent. The invention is also directed to such a nail lacquer for use in treating onychomycosis.

Description

technical field [0001] The present invention relates to a nail polish consisting essentially of ciclopirox as an antifungal agent, hydroxypropyl chitosan as a film former, water and lower alkanol as a solvent. The invention also relates to the use of this nail polish for the treatment of onychomycosis. Background technique [0002] Onychomycosis is an infection of the nails which represents the most common nail disease in the world. At the beginning of the last century, this fungal infection was still considered fairly rare, but during the last decade of the last century its prevalence increased dramatically, in the United States (up to 40% of the general population) and Europe (nearly 30% of specific populations) ) to a very high proportion (Baran R, Hay R, Haneke E, Tosti A (Eds), Epidemiology. In: Onychomycosis-the current approach to diagnosis and therapy. London, Martin Dunitz, 1999: pp. 6-9). Currently, onychomycosis represents about 50% of all nail diseases. It is ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K9/08A61K47/10A61K47/36A61K31/4418A61P31/10
CPCA61K8/34A61K8/4926A61Q3/00A61Q3/02A61Q17/005A61K8/736A61K9/0014A61K47/10A61K47/36A61K9/7015A61K31/4418A61K9/08A61P17/00A61P31/10A61K31/4412
Inventor F·麦兰德D·切里亚尼G·约布S·萨尔诺
Owner POLICHEM SA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap