Measuring device and method for vacuum sealing performance

Abstract

The invention discloses a measuring device and method for a vacuum sealing performance. The device comprises a first standard leaking hole (1), a second standard leaking hole (2), a third standard leaking hole (3), a getter pump (4), a sealed container (5), an angle valve (6), a current-limiting holes (7), a molecular pump group (8), a first dry mechanical pump (9), a gate valve (10), a vacuum gauge (11), a quadrupole mass spectrometer (12), and a measuring chamber (13). In addition, according to the method, an overall leakage rate of the sealed container (5) is measured by using a dynamic method or a static accumulation method and thus a sealing performance of the sealed container is represented; the dynamic method is suitable for large-leakage-rate measurement and the measuring range is associated with a minimum detectable signal and orifice conductance of the quadrupole mass spectrometer (12); and the static accumulation method is suitable for low-helium-leakage-rate measurement and the helium leakage rate of the sealed container (5) is calculated based on measurement on helium partial pressures accumulated in the room by the quadrupole mass spectrometer.

Description

technical field [0001] The invention relates to a vacuum sealing performance measuring device and a measuring method of a sealed container, especially suitable for measuring the total leak rate and the partial pressure leak rate of the sealed container. Background technique [0002] In order to ensure the normal operation of the system under extreme conditions, such as the vacuum environment of semiconductor processing, or the space environment of high vacuum, extremely low temperature, and strong radiation, it needs to be sealed in a sealed container to isolate the system from the extreme environment and ensure the system run smoothly. For example, in the process of semiconductor processing in a vacuum environment, the various electronic systems and electronic components contained in the controller are within 10 -2 Pa~10 2 Working in the low vacuum range of Pa has potential discharge safety hazards; moreover, the electronic systems and electronic components exposed to the...

AI Technical Summary

Problems solved by technology

In order to improve the accuracy of leak calibration, the device needs to be equipped with a complex and precise gas distribution system to provide standard flow and leak flow for comparison. This device is mainly used for measuring units to calibrate standard leaks. It is used for laboratory and industrial leak rate measurement. too complicated

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