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A peripheral exposure method in the manufacture of liquid crystal display panels

A technology of liquid crystal display and exposure method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, pattern surface photolithography technology, etc., can solve the problem that the peripheral exposure pattern affects the utilization rate of the effective area of ​​the motherboard, and achieves Improve the effective area utilization rate, rational design, and reduce the effect of substrate use area

Active Publication Date: 2018-03-13
NANJING CEC PANDA LCD TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the size of the peripheral exposure pattern will directly affect the effective area utilization of the motherboard

Method used

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  • A peripheral exposure method in the manufacture of liquid crystal display panels
  • A peripheral exposure method in the manufacture of liquid crystal display panels
  • A peripheral exposure method in the manufacture of liquid crystal display panels

Examples

Experimental program
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Effect test

Embodiment 1

[0036] For example, in the manufacturing process of a certain liquid crystal display panel, 10 layers of thin film patterns need to be formed on the mother substrate. The first layer is a metal film layer, the second layer is a metal film layer, and the third to tenth layers are non-metal film layers. The film is a copper-titanium alloy film, which is yellow and dark in color, which is indistinguishable from the photoresist by naked eyes. The non-metal film is composed of SiNx, SiO 2 Or made of IGZO material, the color is lighter and transparent, which can be easily distinguished from the photoresist with the naked eye.

[0037] For each scan (scan), the formation of 10 layers of thin film patterns requires 10 masks, which are named the first mask, the second mask, ... the 10th mask, corresponding to the different layers formed Thin film patterns, that is, the first mask is used to form the first layer of thin film patterns, the second mask is used to form the second layer of thin...

Embodiment 2

[0041] For example, in the manufacturing process of a certain liquid crystal display panel, it is necessary to form an N-layer film pattern on the mother substrate. The N-layer film consists of multiple metal film layers (copper-titanium alloy film, yellow) and multiple non-metal film layers (color translucent). Or transparent) composition, peripheral exposure, such as Image 6 , The peripheral pattern of the first layer of film is a measuring scale, and a single row of patterns is beneficial to the reading of other layers. The peripheral pattern positions of the second layer to the next metal film layer overlap, sharing a row of patterns. If the next layer of the metal film layer is still a metal film layer, the peripheral patterns of the next layer of the metal film layer are still in a single line of patterns; if the next layer of the metal film layer is a non-metal film layer, the next layer of the metal film layer will arrive The peripheral pattern positions of the next m...

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Abstract

The invention discloses a periphery exposure method in manufacturing of a liquid crystal display panel. The method comprises the step of exposing the peripheral area of a mask plate, thereby forming N layers of film peripheral patterns on a main substrate, wherein N is more than or equal to 3; N layers of films are composed of dark color material film layers and light color material film layers; a measuring ruler is arranged on the peripheral pattern on the first layer of film; in the second to Nth layers, the upper and lower adjacent light color material film layers form a light color material film layer set; at least two layers of peripheral pattern positions in the light color material film layer set are locally or fully overlapped; the peripheral patterns of the dark color material film layers are not overlapped with the peripheral patterns of any light color material film layers above the dark color material film layers; the peripheral pattern positions of any two dark color material film layers are not overlapped. According to the periphery exposure method, the use area of each substrate with independent peripheral pattern is reduced and the use ratio of effective area of the main substrate is increased.

Description

Technical field [0001] The invention belongs to the field of display technology, and in particular relates to a peripheral exposure method in the manufacture of a liquid crystal display panel. Background technique [0002] With the rapid development of the LCD industry, panel sizes have become more diversified; the high investment in the early stage will inevitably require high returns in the later stage. Therefore, how to maximize benefits is a topic that policy makers first pay attention to. To a large extent, improving substrate utilization is a priority for the R&D department. In addition, because each size has the problem of high space utilization and small remaining space, we should find ways to save the substrate area from other aspects. [0003] Generally, in the panel manufacturing process, it is necessary to form a multilayer film pattern on the mother substrate, that is, multiple masks need to be superimposed and exposed one by one. In addition, due to the limitation o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/1333
CPCG02F1/1333G03F7/70216
Inventor 王强赵辉沙双庆金杨林
Owner NANJING CEC PANDA LCD TECH
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