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34results about How to "Improve effective area utilization" patented technology

Phosphorus and boron liquid source one-shot perfect diffusion process

The invention discloses a phosphorus and boron liquid source one-shot perfect diffusion process. The process is mainly implemented through the following steps that one surface of each silicon wafer with two thinned sides is rotated to be coated with a liquid boron source, baked and then rotated again to be coated with a liquid phosphorus source, lamination is conducted after baking, the silicon wafers are stacked on a silicon boat pairwise to be subjected to one-shot perfect diffusion in the mode that each phosphorus source surface is opposite to the corresponding phosphorus source surface and each boron source surface is opposite to the corresponding boron source surface. Diffused junction depth is even, and reverse breakdown voltage of a product can be stable and good in uniformity; the diffusion concentration gradient is reduced, PN junction field intensity can be effectively improved, discharging-resistant capacity of the product is improved, and the reverse surge capacity of the product can be effectively improved; meanwhile, the source return quantity of the edge of the silicon wafer is small, the number of intra defects is small, and product reliability is high. Processing cost is low, the process is simple, and production is easy.
Owner:SUZHOU QILAN POWER ELECTRONICS

Interference detection device based on light-splitting synchronous phase shifting and detection method

The invention discloses an interference detection device based on light-splitting synchronous phase shifting and a detection method. The interference detection device belongs to the field of optical interference detection. The invention aims to solve problems of difficulty and complexity in operation and low measurement precision of the conventional optical phase shifting interference detection method. The invention has the scheme that a light beam emitted from a light source is carried out collimation light expansion by a polarizing film and a collimation light expansion system to form a linearly polarized light; the linearly polarized light is divided into an object light beam and a reference light beam after passing through a first polarization light splitting prism; the object light beam and the reference light beam gathered on a second polarization light splitting prism pass through a lambda/4 wave plate, a rectangular window, a first Fourier lens, a one-dimensional period grating, a second Fourier lens, a depolarization light splitting prism and a four-quadrant polarizing film group in sequence; an interference pattern is generated on a plane of an image sensor; the interference pattern obtained by collection is processed by a computer; and phase distribution of an object to be detected is obtained.
Owner:HARBIN ENG UNIV

Membrane electrode and current collecting board element of electrochemical cell and electrochemical cell module

The invention discloses a membrane electrode and current collecting board element of an electrochemical cell, which comprises a layer of membrane, a lateral gas diffusion layer and a lateral porous current collecting board that are superposed in sequence; the lateral gas diffusion layer is arranged on the lateral porous current collecting board and the middle of the membrane; and the side surface of the periphery of the lateral gas diffusion layer is filled with sealing materials and solidified. The invention also discloses an electrochemical cell module comprising at least one electrochemical single cell; and the electrochemical single cell comprises an end plate with a gas flow passage at one side, an element and an end plate with a gas flow passage at the other side that are superposed in sequence. Compared with the prior art, the technical proposal simplifies the structure and the assembly technology, thus reducing the cost of production in batches, improving the utilization rate of the effective area of the membrane electrode simultaneously and being applicable to production of fuel cells, electrolytic cells, regenerative fuel cells and electrochemistry oxygen generators.
Owner:JIANGSU QINGNENG NEW ENERGY TECHNOLOGIES CO LTD

Orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and detecting method therefor

The invention provides an orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and a detecting method for the orthogonal double-grating based detecting device, belonging to the field of the detection of optical interference. The invention aims at solving the problem that the existing optical phase shift interference detecting method is complex and hard to operate, and is high in cost and low in measurement precision caused by a high-quality lambda/4 wave plate. The invention has the scheme that a light beam emitted out of a light source is incident into a light receiving surface of a collimating and beam expanding system through a polarizing film, an emergent light beam collimated and expanded by the collimating and beam expanding system is incident into a first lens through two lambda/4 wave plates, an object to be tested and a rectangular window opening, an emergent light beam collected by the first lens is incident into a second lens through the double gratings formed by a one-dimensional cyclic range grating and a one-dimensional cyclic phase shift grating, a diffraction light beam transmitted by the second lens is incident into a four-quadrant polarizing film set, an emergent light beam of the four-quadrant polarizing film set is received by an imaging sensor, and an image signal output end of the imaging sensor is connected with an image input end of a computer, and obtains the phase distribution of the object to be tested.
Owner:HARBIN ENG UNIV

Cathode patterns of electric semiconductor device and patterned arrangement method of cathode fingers thereof

The invention discloses cathode patterns of an electric semiconductor device and a patterned arrangement method of cathode fingers thereof, which are widely applied in the design of cathode patterns in an electric semiconductor, an electric electronic device, an all-controlled thyristor and the like. The cathode patterns comprises equant sector areas and concentric rings which are divided with a circle centre as an axle; the intersecting places of the sector areas and the concentric rings are pattern units; fingers distributed in the sector areas and located in one ring are arranged along a circle arc of the ring; the outer edge lines of each circle of fingers are circular arcs; and the directions of the fingers are all parallel to the centre lines of the sector areas; and gate pole fast channels are left between adjacent two sector areas. The cathode patterns are transferred to the surfaces of chips by photoetching the designed photomask plates to finish the final manufacturing. According to the cathode patterns and the patterned arrangement method of the cathode fingers thereof, the utilization rate of the effective areas of the chips is increased; the opening / closing uniformityof each finger is improved; the balancing of the opening / closing difference of the fingers, caused by the distance from gate pole electrodes is facilitated; and the machining formation is conveniently realized.
Owner:ZHUZHOU CRRC TIMES SEMICON CO LTD

Common-path interference detecting device based on beam-split synchronism phase shifting and detecting method

A common-path interference detecting device based on beam-split synchronism phase shifting and a detecting method belong to the field of optical interference detection, and solve the problems that the existing optical phase shifting interference detecting method is complicated and difficult to operate, requires high-quality lambda / 4 wave plates, and has high cost and poor measuring precision. The scheme provided by the invention is as follows: the light beam emitted by a light source is incident to the light receiving surface of a collimating and expanding system through a polaroid, the outgoing beam collimated and expanded by the collimating and expanding system is incident to a first lens through two lambda / 4 wave plates, a to-be-detected object and a rectangular window, the outgoing beam converged by the first lens is incident to a second lens through a one-dimensional periodic grating, the diffracted light beam transmitted by the second lens is incident to a beam-split synchronism phase shifting system, the outgoing beam of the beam-split synchronism phase shifting system is received by the light receiving surface of an image sensor, and the image signal output end of the image sensor is connected with the image signal input end of a computer, so as to obtain the phase distribution of the to-be-detected object.
Owner:HARBIN ENG UNIV

Silicon wafer/battery sheet, photovoltaic battery assembly, carrier and design and arrangement method

PendingCN111463301AMaximum effective area utilizationMaximize effective area utilizationFinal product manufactureSemiconductor/solid-state device manufacturingElectrical batteryEngineering
The embodiment of the invention provides a silicon wafer / battery sheet, a photovoltaic battery assembly, a carrier and a design and arrangement method, and relates to the field of photovoltaics. According to the invention, the appearance of the silicon wafer / battery sheet is a rectangle or a quasi-rectangle with a chamfer, the lengths of two adjacent sides are x and y respectively, x is not equalto y, and the chamfer area of the quasi-rectangle with chamfer accounts for not more than 5% of the total area; the photovoltaic battery assembly is mainly formed by splicing a plurality of battery sheets; the carrier is provided with an opening, the length of the opening of the carrier is equal to the length of the short side of the silicon wafer / battery sheet, and the silicon wafer / battery sheetcan be inserted into the opening along the direction of the long side; the photovoltaic battery assembly is formed by splicing battery sheets, the specification of the photovoltaic battery assembly adapts to the limitation of logistics, glass and the like, and the power of a single sheet is relatively high; the carrier is suitable for supporting a super-large silicon wafer / battery sheet; and under the specific condition that the size of the assembly product is limited, the single-chip power of the assembly product is maximized by designing and using a reasonable silicon chip / battery sheet size.
Owner:RISEN ENERGY

Intelligent costume design management system

The invention relates to the technical field of costume design, and discloses an intelligent costume design management system which comprises a table board, two guide grooves are symmetrically formed in the side edge of the table board, two supporting legs are fixedly installed at the bottom of the table board, dust collection grooves are formed in the two supporting legs, and a storage groove is formed in the side, away from a fixed baffle, of the side wall of the table board. The top of the table plate is provided with a dredging hole communicated with the guide grooves, the interior of the dredging hole is provided with a rotatable rotating disc, the rotating disc comprises a moving disc, the moving disc is provided with a moving hole, and the moving hole is connected with a connecting device in a clamped mode. According to the system, by setting a second magnetic ring, the connecting device, a cleaning groove and a cleaning disc, after the second magnetic ring downwards penetrates through a connecting hole and is inserted into the cleaning groove, a limiting column fixes the connecting device and a clamp to the rotating disc at the moment, the supporting legs of the limiting column and a first magnetic ring are magnetically attracted and fixed at the moment, the connecting device and the rotating disc are fixed into the dredging hole for the second time, and the multiple fixing effect is achieved.
Owner:山东圣梵尼服饰股份有限公司

Periphery exposure method in manufacturing of liquid crystal display panel

The invention discloses a periphery exposure method in manufacturing of a liquid crystal display panel. The method comprises the step of exposing the peripheral area of a mask plate, thereby forming N layers of film peripheral patterns on a main substrate, wherein N is more than or equal to 3; N layers of films are composed of dark color material film layers and light color material film layers; a measuring ruler is arranged on the peripheral pattern on the first layer of film; in the second to Nth layers, the upper and lower adjacent light color material film layers form a light color material film layer set; at least two layers of peripheral pattern positions in the light color material film layer set are locally or fully overlapped; the peripheral patterns of the dark color material film layers are not overlapped with the peripheral patterns of any light color material film layers above the dark color material film layers; the peripheral pattern positions of any two dark color material film layers are not overlapped. According to the periphery exposure method, the use area of each substrate with independent peripheral pattern is reduced and the use ratio of effective area of the main substrate is increased.
Owner:NANJING CEC PANDA LCD TECH

Electronic part machining machine

The invention provides an electronic part machining machine, and particularly relates to the field of mechanical automation devices. Elements are sequentially arranged in a feeding pipe; the lower endof a feeding pipe guide rail is connected with a base surface; the two ends of the feeding pipe are embedded into sliding grooves, and the feeding pipe can move up and down in a reciprocating mode; one end of a guide groove is connected with one end of the feeding pipe, and the lower ends of the elements are located in the guide groove; a material receiving mechanism comprises a plurality of material receiving pipes, the material receiving pipes are sequentially stacked in the horizontal direction, the cross sections of the material receiving pipes are identical to the cross sections of the elements, and the ends of the material receiving pipes are connected with the other end of the guide groove; a shearing mechanism comprises a cutter cylinder, the cutter cylinder is arranged on the base surface, and a cutter is arranged at the end part of an ejector rod of the cutter cylinder; a cutting board matched with the cutter is arranged on a base plate; a glue dispensing mechanism is provided with a glue dispensing head, and the glue dispensing head can move up and down; the feeding pipe is arranged on the side face of a vibration disc and extends to the position above the elements; andan ejector rod of an air cylinder is inserted into the feeding pipe. According to the electronic part machining machine, the production efficiency can be improved, and the production cost can be reduced.
Owner:吴江市永健达金属制品有限公司

Implantable infusion port and using method

The invention discloses an implantable infusion port. The implantable infusion port comprises a port body, a liquid storage cavity formed in the port body, a connecting pipe used for fixing a catheterand the port body and an injection piece fixedly arranged on the port body, wherein the liquid storage cavity is provided with a first opening and a second opening; the minimum caliber of the first opening is larger than the maximum caliber of the second opening; the injection piece is fixed into the first opening; the catheter communicates with the second opening; and the first opening is obliquely formed. The implantable infusion port has the advantages that the overall height of the infusion port in the implantation part of a patient is reduced, the pulling force of the infusion port on the skin of the patient is reduced, and the pain and foreign body sensation of the patient are reduced; in cooperation with a linear type non-injury needle, medical staff can operate and use the implantable infusion port conveniently, the effective area utilization rate of a puncture window is increased, the operation complexity is reduced, and the occurrence rate of postoperative mechanical phlebitis is reduced; and the occurrence rate of avascular necrosis caused by postoperative skin tension deficiency is reduced.
Owner:SUZHOU LINHWA MEDICAL DEVICES CO LTD

Cathode patterns of electric semiconductor device and patterned arrangement method of cathode fingers thereof

The invention discloses cathode patterns of an electric semiconductor device and a patterned arrangement method of cathode fingers thereof, which are widely applied in the design of cathode patterns in an electric semiconductor, an electric electronic device, an all-controlled thyristor and the like. The cathode patterns comprises equant sector areas and concentric rings which are divided with a circle centre as an axle; the intersecting places of the sector areas and the concentric rings are pattern units; fingers distributed in the sector areas and located in one ring are arranged along a circle arc of the ring; the outer edge lines of each circle of fingers are circular arcs; and the directions of the fingers are all parallel to the centre lines of the sector areas; and gate pole fast channels are left between adjacent two sector areas. The cathode patterns are transferred to the surfaces of chips by photoetching the designed photomask plates to finish the final manufacturing. According to the cathode patterns and the patterned arrangement method of the cathode fingers thereof, the utilization rate of the effective areas of the chips is increased; the opening / closing uniformityof each finger is improved; the balancing of the opening / closing difference of the fingers, caused by the distance from gate pole electrodes is facilitated; and the machining formation is conveniently realized.
Owner:ZHUZHOU CRRC TIMES SEMICON CO LTD

One-time Total Diffusion Technology of Phosphorus and Boron Liquid Source

The invention discloses a phosphorus and boron liquid source one-shot perfect diffusion process. The process is mainly implemented through the following steps that one surface of each silicon wafer with two thinned sides is rotated to be coated with a liquid boron source, baked and then rotated again to be coated with a liquid phosphorus source, lamination is conducted after baking, the silicon wafers are stacked on a silicon boat pairwise to be subjected to one-shot perfect diffusion in the mode that each phosphorus source surface is opposite to the corresponding phosphorus source surface and each boron source surface is opposite to the corresponding boron source surface. Diffused junction depth is even, and reverse breakdown voltage of a product can be stable and good in uniformity; the diffusion concentration gradient is reduced, PN junction field intensity can be effectively improved, discharging-resistant capacity of the product is improved, and the reverse surge capacity of the product can be effectively improved; meanwhile, the source return quantity of the edge of the silicon wafer is small, the number of intra defects is small, and product reliability is high. Processing cost is low, the process is simple, and production is easy.
Owner:SUZHOU QILAN POWER ELECTRONICS

A clothing intelligent design management system

The invention relates to the technical field of clothing design, and discloses an intelligent clothing design management system, which includes a table, two guide grooves are symmetrically opened on the side of the table, two support legs are fixedly installed on the bottom of the table, two support legs There are dust collection grooves on the legs, storage grooves are provided on the side wall of the table board and the side far away from the fixed baffle, and a dredging hole connected to the guide groove is opened on the top of the table board, and a rotatable turntable is arranged inside the dredging hole , the turntable includes a moving plate, and a moving hole is opened on the moving plate, and a connecting device is clamped on the moving hole. In the present invention, the magnetic ring 2 is penetrated downward by setting the magnetic ring 2, the connecting device, the cleaning tank and the cleaning plate. The connection hole plug-in is behind the cleaning tank. At this time, the limit column fixes the connection device and the fixture on the turntable. At this time, the support leg of the limit column and the magnetic ring 1 are magnetically adsorbed and fixed, and the connection device and the turntable are fixed inside the dredge hole for the second time. , with multiple fixed effects.
Owner:山东圣梵尼服饰股份有限公司

Orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and detecting method therefor

The invention provides an orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and a detecting method for the orthogonal double-grating based detecting device, belonging to the field of the detection of optical interference. The invention aims at solving the problem that the existing optical phase shift interference detecting method is complex and hard to operate, and is high in cost and low in measurement precision caused by a high-quality lambda / 4 wave plate. The invention has the scheme that a light beam emitted out of a light source is incident into a light receiving surface of a collimating and beam expanding system through a polarizing film, an emergent light beam collimated and expanded by the collimating and beam expanding system is incident into a first lens through two lambda / 4 wave plates, an object to be tested and a rectangular window opening, an emergent light beam collected by the first lens is incident into a second lens through the double gratings formed by a one-dimensional cyclic range grating and a one-dimensional cyclic phase shift grating, a diffraction light beam transmitted by the second lens is incident into a four-quadrant polarizing film set, an emergent light beam of the four-quadrant polarizing film set is received by an imaging sensor, and an image signal output end of the imaging sensor is connected with an image input end of a computer, and obtains the phase distribution of the object to be tested.
Owner:HARBIN ENG UNIV

Common-path interference detecting device based on beam-split synchronism phase shifting and detecting method

A common-path interference detecting device based on beam-split synchronism phase shifting and a detecting method belong to the field of optical interference detection, and solve the problems that the existing optical phase shifting interference detecting method is complicated and difficult to operate, requires high-quality lambda / 4 wave plates, and has high cost and poor measuring precision. The scheme provided by the invention is as follows: the light beam emitted by a light source is incident to the light receiving surface of a collimating and expanding system through a polaroid, the outgoing beam collimated and expanded by the collimating and expanding system is incident to a first lens through two lambda / 4 wave plates, a to-be-detected object and a rectangular window, the outgoing beam converged by the first lens is incident to a second lens through a one-dimensional periodic grating, the diffracted light beam transmitted by the second lens is incident to a beam-split synchronism phase shifting system, the outgoing beam of the beam-split synchronism phase shifting system is received by the light receiving surface of an image sensor, and the image signal output end of the image sensor is connected with the image signal input end of a computer, so as to obtain the phase distribution of the to-be-detected object.
Owner:HARBIN ENG UNIV

A high-efficiency guide type cotton cleaning device for textile production

The invention discloses a high-efficiency diversion type cotton cleaning device for textile production, which relates to the field of textile technology; in order to solve the problem of cotton thread pulling and breaking; it specifically includes a base, the top outer wall of the base is connected with a cotton cleaning mechanism through a lifting mechanism, the The top outer wall of the base is respectively provided with a filter mechanism and an adaptive adjustment mechanism. The adaptive adjustment mechanism includes two height limit rollers and a hollow roller. The top outer wall of the base is fixed with two vertical plates by bolts. The inner wall of the vertical plate There is a chute, the inner wall of the chute is slidably connected with a slider, the hollow roller is connected to the inner wall of the slider through a rotating shaft, and the two height-limiting rollers are connected to the inner wall of the vertical plate through another rotating shaft. A distance sensor is clamped on the top of the board close to the inner wall of the chute, and the distance sensor is electrically connected to a buzzer. The projections of the two height-limiting rollers on the base are respectively located on both sides of the hollow roller. The present invention prevents it from breaking.
Owner:湖南尚珂伊针纺有限公司
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