34results about How to "Improve effective area utilization" patented technology

The invention discloses a membrane electrode and current collecting board element of an electrochemical cell, which comprises a layer of membrane, a lateral gas diffusion layer and a lateral porous current collecting board that are superposed in sequence; the lateral gas diffusion layer is arranged on the lateral porous current collecting board and the middle of the membrane; and the side surface of the periphery of the lateral gas diffusion layer is filled with sealing materials and solidified. The invention also discloses an electrochemical cell module comprising at least one electrochemical single cell; and the electrochemical single cell comprises an end plate with a gas flow passage at one side, an element and an end plate with a gas flow passage at the other side that are superposed in sequence. Compared with the prior art, the technical proposal simplifies the structure and the assembly technology, thus reducing the cost of production in batches, improving the utilization rate of the effective area of the membrane electrode simultaneously and being applicable to production of fuel cells, electrolytic cells, regenerative fuel cells and electrochemistry oxygen generators.

The embodiment of the invention provides a silicon wafer / battery sheet, a photovoltaic battery assembly, a carrier and a design and arrangement method, and relates to the field of photovoltaics. According to the invention, the appearance of the silicon wafer / battery sheet is a rectangle or a quasi-rectangle with a chamfer, the lengths of two adjacent sides are x and y respectively, x is not equalto y, and the chamfer area of the quasi-rectangle with chamfer accounts for not more than 5% of the total area; the photovoltaic battery assembly is mainly formed by splicing a plurality of battery sheets; the carrier is provided with an opening, the length of the opening of the carrier is equal to the length of the short side of the silicon wafer / battery sheet, and the silicon wafer / battery sheetcan be inserted into the opening along the direction of the long side; the photovoltaic battery assembly is formed by splicing battery sheets, the specification of the photovoltaic battery assembly adapts to the limitation of logistics, glass and the like, and the power of a single sheet is relatively high; the carrier is suitable for supporting a super-large silicon wafer / battery sheet; and under the specific condition that the size of the assembly product is limited, the single-chip power of the assembly product is maximized by designing and using a reasonable silicon chip / battery sheet size.

The invention discloses cathode patterns of an electric semiconductor device and a patterned arrangement method of cathode fingers thereof, which are widely applied in the design of cathode patterns in an electric semiconductor, an electric electronic device, an all-controlled thyristor and the like. The cathode patterns comprises equant sector areas and concentric rings which are divided with a circle centre as an axle; the intersecting places of the sector areas and the concentric rings are pattern units; fingers distributed in the sector areas and located in one ring are arranged along a circle arc of the ring; the outer edge lines of each circle of fingers are circular arcs; and the directions of the fingers are all parallel to the centre lines of the sector areas; and gate pole fast channels are left between adjacent two sector areas. The cathode patterns are transferred to the surfaces of chips by photoetching the designed photomask plates to finish the final manufacturing. According to the cathode patterns and the patterned arrangement method of the cathode fingers thereof, the utilization rate of the effective areas of the chips is increased; the opening / closing uniformityof each finger is improved; the balancing of the opening / closing difference of the fingers, caused by the distance from gate pole electrodes is facilitated; and the machining formation is conveniently realized.

The invention discloses a phosphorus and boron liquid source one-shot perfect diffusion process. The process is mainly implemented through the following steps that one surface of each silicon wafer with two thinned sides is rotated to be coated with a liquid boron source, baked and then rotated again to be coated with a liquid phosphorus source, lamination is conducted after baking, the silicon wafers are stacked on a silicon boat pairwise to be subjected to one-shot perfect diffusion in the mode that each phosphorus source surface is opposite to the corresponding phosphorus source surface and each boron source surface is opposite to the corresponding boron source surface. Diffused junction depth is even, and reverse breakdown voltage of a product can be stable and good in uniformity; the diffusion concentration gradient is reduced, PN junction field intensity can be effectively improved, discharging-resistant capacity of the product is improved, and the reverse surge capacity of the product can be effectively improved; meanwhile, the source return quantity of the edge of the silicon wafer is small, the number of intra defects is small, and product reliability is high. Processing cost is low, the process is simple, and production is easy.

The invention relates to the technical field of clothing design, and discloses an intelligent clothing design management system, which includes a table, two guide grooves are symmetrically opened on the side of the table, two support legs are fixedly installed on the bottom of the table, two support legs There are dust collection grooves on the legs, storage grooves are provided on the side wall of the table board and the side far away from the fixed baffle, and a dredging hole connected to the guide groove is opened on the top of the table board, and a rotatable turntable is arranged inside the dredging hole , the turntable includes a moving plate, and a moving hole is opened on the moving plate, and a connecting device is clamped on the moving hole. In the present invention, the magnetic ring 2 is penetrated downward by setting the magnetic ring 2, the connecting device, the cleaning tank and the cleaning plate. The connection hole plug-in is behind the cleaning tank. At this time, the limit column fixes the connection device and the fixture on the turntable. At this time, the support leg of the limit column and the magnetic ring 1 are magnetically adsorbed and fixed, and the connection device and the turntable are fixed inside the dredge hole for the second time. , with multiple fixed effects.

The invention provides an orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and a detecting method for the orthogonal double-grating based detecting device, belonging to the field of the detection of optical interference. The invention aims at solving the problem that the existing optical phase shift interference detecting method is complex and hard to operate, and is high in cost and low in measurement precision caused by a high-quality lambda / 4 wave plate. The invention has the scheme that a light beam emitted out of a light source is incident into a light receiving surface of a collimating and beam expanding system through a polarizing film, an emergent light beam collimated and expanded by the collimating and beam expanding system is incident into a first lens through two lambda / 4 wave plates, an object to be tested and a rectangular window opening, an emergent light beam collected by the first lens is incident into a second lens through the double gratings formed by a one-dimensional cyclic range grating and a one-dimensional cyclic phase shift grating, a diffraction light beam transmitted by the second lens is incident into a four-quadrant polarizing film set, an emergent light beam of the four-quadrant polarizing film set is received by an imaging sensor, and an image signal output end of the imaging sensor is connected with an image input end of a computer, and obtains the phase distribution of the object to be tested.

A common-path interference detecting device based on beam-split synchronism phase shifting and a detecting method belong to the field of optical interference detection, and solve the problems that the existing optical phase shifting interference detecting method is complicated and difficult to operate, requires high-quality lambda / 4 wave plates, and has high cost and poor measuring precision. The scheme provided by the invention is as follows: the light beam emitted by a light source is incident to the light receiving surface of a collimating and expanding system through a polaroid, the outgoing beam collimated and expanded by the collimating and expanding system is incident to a first lens through two lambda / 4 wave plates, a to-be-detected object and a rectangular window, the outgoing beam converged by the first lens is incident to a second lens through a one-dimensional periodic grating, the diffracted light beam transmitted by the second lens is incident to a beam-split synchronism phase shifting system, the outgoing beam of the beam-split synchronism phase shifting system is received by the light receiving surface of an image sensor, and the image signal output end of the image sensor is connected with the image signal input end of a computer, so as to obtain the phase distribution of the to-be-detected object.

The invention discloses a high-efficiency diversion type cotton cleaning device for textile production, which relates to the field of textile technology; in order to solve the problem of cotton thread pulling and breaking; it specifically includes a base, the top outer wall of the base is connected with a cotton cleaning mechanism through a lifting mechanism, the The top outer wall of the base is respectively provided with a filter mechanism and an adaptive adjustment mechanism. The adaptive adjustment mechanism includes two height limit rollers and a hollow roller. The top outer wall of the base is fixed with two vertical plates by bolts. The inner wall of the vertical plate There is a chute, the inner wall of the chute is slidably connected with a slider, the hollow roller is connected to the inner wall of the slider through a rotating shaft, and the two height-limiting rollers are connected to the inner wall of the vertical plate through another rotating shaft. A distance sensor is clamped on the top of the board close to the inner wall of the chute, and the distance sensor is electrically connected to a buzzer. The projections of the two height-limiting rollers on the base are respectively located on both sides of the hollow roller. The present invention prevents it from breaking.