Chuck table and cleaning device
A technology for a chuck table and a cleaning device, which is applied in the manufacture of electrical components, circuits, semiconductor/solid-state devices, etc., and can solve problems such as deformation and damage
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[0019] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. when referring to figure 1 (A), a perspective view of the wafer unit 19 is shown. figure 1 (B) is a sectional view of the wafer unit 19 .
[0020] On the front surface of a semiconductor wafer (hereinafter simply referred to as a wafer) 11, a plurality of dividing lines (streets) 13 are formed in a grid pattern, and devices 15 such as ICs and LSIs are formed in each area divided by the dividing lines 13. .
[0021] The wafer unit 19 is configured such that the back surface of the wafer 11 is bonded to a dicing tape T serving as an adhesive tape, and the outer peripheral portion of the adhesive tape is bonded to the ring frame F so as to cover the opening 17 of the ring frame F. That is, in the wafer unit 19 , the wafer 15 is supported by the ring frame F via the dicing tape T. As shown in FIG.
[0022] refer to figure 2 , shows a partially cutaway perspect...
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