Helmet lining buffer fabric with clear pattern edges
A fabric and edge technology, which is applied to the field of cushioning fabrics in helmets, can solve the problems of inability to meet the needs of use and insufficient cushioning capacity, and achieve the effects of simple structure, no deformation of embossing, and clear pattern edges.
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[0015] See figure 1 , The present invention relates to a cushion fabric for the inner liner of a helmet with a clear pattern edge, comprising a fabric base layer. The two sides of the fabric base layer are sequentially provided with an impact liner layer, a foam layer and a buffer layer from the inside to the outside; The stitching distance of the buffer layer is a multiple of the stitching distance of the foamed layer; the stitching distance of the foamed layer is the stitching distance of the impact liner layer. Multiple; the fabric base layer is woven with aramid fibers; the impact liner layer is filled with micron-level silicone cavities; the foam layer is filled with polyurethane pre-foam; the buffer layer is made of SEE ecological Woven from cotton.
[0016] Preferably, the multiple of the stitching distance is 2.
[0017] The back of the fabric base layer is provided with a lining fabric layer. The lining fabric layer is formed by interweaving warp threads made of sea-isla...
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