Preparation method for sputtering titanium ring

A titanium ring and sputtering technology, which is applied in the field of titanium metal product processing, can solve the problems of investing a lot of manpower and energy, inconsistent lines, cumbersome processes, etc., and achieve the effects of improving product quality, improving work efficiency, and reducing costs

Inactive Publication Date: 2017-03-15
GRIKIN ADVANCED MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Patent CN101920435A discloses the preparation method of the traditional titanium ring: Ti bar preparation→rolling→welding→machining→knurling→cutting→cleaning. The process is cumbersome

Method used

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  • Preparation method for sputtering titanium ring
  • Preparation method for sputtering titanium ring
  • Preparation method for sputtering titanium ring

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Take 9kg of 99.995% titanium ingot, forge it into a "170×60mm" billet, roll it in one direction to a thickness of 6mm, level it after annealing at 960°C / 1h, and cut it into "900×55mm" Long slats, CNC milled to 893×50.5×3.2mm, flatness 0.2mm, thickness difference 0.13mm, surface roughness Ra=1.1μm.

[0027] Choose a laser with a pulse width of 50ns, an average power of 60w, a pulse frequency of 20kHz, and an engraving line speed of 1500mm / s to engrave diamond-shaped lines on the long titanium slabs. The thickness of each layer is controlled to 0.05mm, and the duration is about 5h. Roll round, roundness 0.8mm, use 20% nitric acid, 5% hydrofluoric acid mixed acid to clean the engraved titanium ring for 4 minutes, then rinse with water, dehydrate and dry with absolute ethanol, the surface of the titanium ring is clean and free of dirt, The surface presents a uniform and smooth Ti metallic color.

Embodiment 2

[0029] Take 8.5kg of 99.999% titanium ingot, forge it into a "170×60mm" billet, roll it in one direction to a thickness of 5.6mm, level it after annealing at 885°C / 2h, and cut it into a "900×55mm" "Long slats, CNC milling to 893×50.5×3.2mm, flatness 0.16mm, thickness difference 0.1mm, surface roughness Ra=0.8μm.

[0030] Choose a laser with a pulse width of 10ns, an average power of 150w, a pulse frequency of 100kHz, and an engraving line speed of 3000mm / s to engrave regular hexagonal patterns on titanium long slabs. The thickness of each layer is controlled at 0.1mm, and the duration is about 7h. The roundness of the circular machine is 0.8mm. The engraved titanium ring is cleaned with a mixed acid of 30% nitric acid and 4% hydrofluoric acid for 6 minutes, then rinsed with clean water, dehydrated with absolute ethanol and dried. The surface of the titanium ring is clean and free of dirt. Dirt, engrave a regular hexagonal column with a side length of 1mm and a depth of 0.5mm. ...

Embodiment 3

[0032] Receive about 8.8kg of 99.95% titanium ingot, forge it into a "170×60mm" billet, roll it in one direction to a thickness of 5.5mm, level it after annealing at 1200℃ / 2h, and cut it into a "900× 55mm” long slats, CNC milling to 893×50.5×3.2mm, flatness 0.18mm, thickness difference 0.12mm, surface roughness Ra=0.7μm.

[0033] Choose a laser with a pulse width of 90ns, an average power of 120w, a pulse frequency of 80kHz, and an engraving line speed of 1500mm / s to engrave circular lines on the long titanium slabs. The thickness of each layer is controlled to 0.15mm, and the duration is about 6h. Machine-rolled round, roundness 1mm, use 20% nitric acid, 7% hydrofluoric mixed acid solution to clean the engraved titanium ring for 4 minutes, then rinse with clean water, dehydrate and dry with absolute ethanol, the surface of the titanium ring is clean and free of dirt, and the engraved The outer diameter is 0.7mm, and the depth is 0.4mm cylindrical.

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Abstract

The invention discloses a preparation method for a sputtering titanium ring and belongs to the technical field of titanium metal product machining. The method comprises the steps of: selecting a Ti cast ingot, the purity of which is 99.95% above, and manufacturing a titanium batten through forging, rolling, thermal treatment, leveling and machining; removing surface dirt and engraving the surfaces of the titanium batten with laser; then rolling the engraved titanium batten to a titanium ring by using a rolling machine; and cleaning and drying the titanium ring to obtain the sputtering titanium ring. The stress of the rolled Ti batten machined by the high-temperature thermal treatment process is small; by adopting laser engraving, grains of various types can be machined as required, so that the using quality of the product is improved, the product quality is stable and consistent and meanwhile, the work efficiency is improved and the cost is lowered.

Description

technical field [0001] The invention belongs to the technical field of titanium metal product processing, and in particular relates to a preparation method of a sputtering titanium ring. Background technique [0002] Physical vapor deposition (PVD) plays a pivotal role in the semiconductor manufacturing process. The metallization process in the chip manufacturing process, such as the preparation of interconnect lines, contacts, via holes, barrier layers and adhesive layers, requires the use of PVD. Finish. The titanium ring is used in conjunction with the high-purity Ti target, and can be used to prepare Ti metallized films by sputtering, mainly used for TiN / Ti barrier layers, TiN anti-reflection layers (ARC) and TiSi in the metallization process of integrated circuit aluminum processes. 2 Production of contact etc. The main functions of the titanium ring are: [0003] (1) After the titanium ring is energized, a magnetic field is generated to constrain the trajectory of t...

Claims

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Application Information

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IPC IPC(8): B23P15/00
CPCB23P15/00
Inventor 万小勇徐学礼何金江王越刘志杰丁照崇陈明刘书芹
Owner GRIKIN ADVANCED MATERIALS
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