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Method for determining correlation between characteristics of optical thin films

A technology of optical thin film and determination method, which is applied in the direction of phase influence characteristic measurement, material analysis through optical means, scientific instruments, etc. It can solve the problem of less reports on the relationship between thin film properties and achieve the effect of general versatility

Inactive Publication Date: 2017-04-05
TIANJIN JINHANG INST OF TECH PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Researchers tend to focus on the change of properties with process parameters, such as the relationship between preparation process parameters and film stress properties, microstructural properties and optical properties, etc., and there are few reports on the relationship between film properties

Method used

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  • Method for determining correlation between characteristics of optical thin films
  • Method for determining correlation between characteristics of optical thin films
  • Method for determining correlation between characteristics of optical thin films

Examples

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example 1

[0050] Example 1: HfO Sputtering with Ion Beam 2 Thin films, investigate the correlation between the refractive index and stress of thin films.

[0051](1) Using ion beam sputtering deposition technology to prepare HfO on quartz substrate 2 Thin film, experimental process parameters according to L 9 (3 4 ) Orthogonal experimental design, for HfO 2 The films were prepared under nine process conditions, and the stress and refractive index characteristics of the films prepared under different conditions were tested. The experimental conditions and test results are shown in Attached Table 1.

[0052] (2) Refractive index matrix X and stress matrix Y are shown in Table 1;

[0053] Table 1 HfO 2 Thin film preparation conditions and test results

[0054]

[0055] (3) Calculate HfO 2 The correlation coefficient between film refractive index matrix X and stress matrix Y is -0.92049;

[0056] (4) The calculated t-test statistical value is 6.23246;

[0057] (5) The degree of ...

example 2

[0064] Example 2: Sputtering Ta with ion beam 2 o 5 Thin films, investigate the correlation between the refractive index and stress of thin films.

[0065] (1) Using ion beam sputtering deposition technology to prepare Ta on a quartz substrate 2 o 5 Thin film, experimental process parameters according to L 9 (3 4 ) Orthogonal experimental design, for Ta 2 o 5 The preparation experiments of the thin film were completed under nine process conditions, and the stress and refractive index characteristics of the thin film prepared under different conditions were tested. The experimental conditions and test results are shown in Attached Table 2.

[0066] Table 2 Ta 2 o 5 Thin film preparation conditions and test results

[0067]

[0068] (2) Refractive index matrix X and stress matrix Y are shown in Table 2;

[0069] (3) Calculate Ta 2 o 5 The correlation coefficient between film refractive index matrix X and stress matrix Y is -0.78884;

[0070] (4) The calculated t-...

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Abstract

The invention discloses a method for determining correlation between characteristics of optical thin films. The method is characterized in that by a correlation analysis technology in statistical mathematics and not limited to a specific thin-film processing experimental design, characteristic test results of thin films prepared by two technologies are analyzed to obtain the correlation between two characteristics of the thin films. The method has universality for analysis of correlation between characteristics of optical thin films.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, in particular to the characterization technology of optical properties of optical thin films, and relates to a method for determining the correlation between properties of optical thin films. Background technique [0002] Optical thin film components have important applications in optical instruments and optical systems, such as ultra-low loss laser films for laser gyroscopes, anti-reflection films for optical components in optical systems, and splitting components for optical paths, etc., which have become core in some optical technology fields. One of the techniques. There are many preparation methods for optical thin films, such as thermal evaporation, electron beam evaporation, ion-assisted, ion beam sputtering, magnetron sputtering, atomic layer deposition, sol-gel, thermal oxidation and other methods. Under the preparation process, the film properties of different preparation me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/41
CPCG01N21/41G01N2021/4126
Inventor 刘华松姜承慧刘丹丹杨霄孙鹏冷健季一勤
Owner TIANJIN JINHANG INST OF TECH PHYSICS