Grafting reaction device and use method thereof
A technology of grafting reaction and melting device, which is applied in the field of grafting reaction device to achieve the effect of less crystal points, smooth grafting reaction process and good grafting effect
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[0043] Example 1
[0044] During use, the temperature of the single-screw melting device was set to 190°C, and the screw speed was 300rpm; the temperature of the twin-screw grafting reaction device was set to 140°C, and the screw speed was 300rpm; In the second section and the fifth section, the discharge rate is 1.5kg / h, and the remaining steps and parameters are the same as those in the specific embodiment to obtain the finished product.
Example Embodiment
[0045] Example 2
[0046] During use, the temperature of the single-screw melting device was set to 190°C, and the screw speed was 300rpm; the temperature of the twin-screw grafting reaction device was set to 140°C, and the screw speed was 300rpm; In the second section, the discharge rate is 3kg / h, and the remaining steps and parameters are the same as those in the specific embodiment to obtain a finished product.
Example Embodiment
[0047] Example 3
[0048] During use, the temperature of the single-screw melting device was set to 190°C, and the screw speed was 300rpm; the temperature of the twin-screw grafting reaction device was set to 140°C, and the screw speed was 300rpm; In the fifth section, the discharging speed is 3kg / h, and the remaining steps and parameters are the same as those in the specific embodiment, and the finished product is obtained.
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