Preparation method of novel ZnO-nanosheet-structure coating
A nano-flaky, new technology, applied in the field of preparation of new ZnO nano-flaky structure coatings, to achieve the effect of good feasibility, easy realization, and simple preparation process
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Embodiment 1
[0028] First, a 0.025mol / L ZnO seed layer sol was prepared by the sol-gel method; then the ZnO seed layer film was prepared by pulling the film on ITO glass by dipping and pulling method, and the film was placed in a muffle furnace and kept at 250°C Sinter for 2 hours to obtain the ZnO seed layer film; then put the prepared ZnO seed layer film substrate vertically into the configured 0.1mol / L ZnO growth solution, treat it in a constant temperature water bath at 75°C for 4 hours, and wait for the hydrothermal After the reaction, the corrosion reaction was continued for 5 days in the original growth solution at a normal temperature of 20° C., and the sample was taken out to obtain a new type of ZnO nanosheet structure coating.
Embodiment 2
[0030] First, a 0.025mol / L ZnO seed layer sol was prepared by the sol-gel method; then the ZnO seed layer film was prepared by pulling the film on ITO glass by dipping and pulling method, and the film was placed in a muffle furnace and kept at 250°C Sinter for 2 hours to obtain the ZnO seed layer film; then put the prepared ZnO seed layer film substrate vertically into the configured 0.025mol / L ZnO growth solution, treat it in a constant temperature water bath at 75°C for 4 hours, and wait for the hydrothermal After the reaction, the corrosion reaction was continued for 7 days in the original growth solution at a normal temperature of 20° C., and the sample was taken out to obtain a new type of ZnO nanosheet structure coating.
Embodiment 3
[0032] First, a 0.025mol / L ZnO seed layer sol was prepared by the sol-gel method; then the ZnO seed layer film was prepared by pulling the film on ITO glass by dipping and pulling method, and the film was placed in a muffle furnace and kept at 250°C Sinter for 2 hours to obtain the ZnO seed layer film; then put the prepared ZnO seed layer film substrate vertically into the configured 0.1mol / L ZnO growth solution, treat it in a constant temperature water bath at 75°C for 4 hours, and wait for the hydrothermal After the reaction, the corrosion reaction was continued for 10 days in the original growth solution at a normal temperature of 20° C., and the sample was taken out to obtain a new type of ZnO nanosheet structure coating.
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