A kind of honeycomb tio2-ag nanocomposite and preparation method thereof
A nanocomposite and nanocomposite technology, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve problems such as the difficulty in synthesizing non-silicon-based materials, and achieve a highly ordered structure and low cost , the effect of stable performance
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Embodiment 1
[0023] 1. Preparation of two-dimensional ordered polystyrene colloidal arrays
[0024] A single-layer two-dimensional ordered colloidal ball template was prepared by self-assembly technology. The specific steps were: put the silicon wafer substrate in a mixed solution containing ammonia, hydrogen peroxide and water (volume ratio: 1:2:6) for 300 °C for 5-10 minutes, and then ultrasonically cleaned with deionized water and ethanol solution for 2-3 times. Soak it in 2% sodium lauryl sulfate solution for 24 hours to obtain a hydrophilic substrate surface. Take polystyrene solution and ethanol solution with a volume ratio of 1:1 and mix them, ultrasonically oscillate for 5s, then take an appropriate amount of the mixed solution and drop it on the silicon wafer substrate after hydrophilic treatment. Immerse in a container with a concentration of 12-15mmol / L NaCl saline solution. Under the action of the surface tension of the brine, the mixed solution oscillates and diffuses with th...
Embodiment 2
[0030] 1. Preparation of two-dimensional ordered polystyrene colloidal arrays
[0031] A single-layer two-dimensional ordered colloidal ball template was prepared by self-assembly technology. The specific steps were: put the silicon wafer substrate in a mixed solution containing ammonia, hydrogen peroxide and water (volume ratio: 1:2:6) for 300 °C for 5-10 minutes, and then ultrasonically cleaned with deionized water and ethanol solution for 2-3 times. Soak it in 2% sodium lauryl sulfate solution for 24 hours to obtain a hydrophilic substrate surface. Take polystyrene solution and ethanol solution with a volume ratio of 1:1 and mix them, ultrasonically oscillate for 5s, then take an appropriate amount of the mixed solution and drop it on the silicon wafer substrate after hydrophilic treatment. Immerse in a container filled with a NaCl solution with a concentration of 12-15mmol / L. Under the action of the surface tension of the brine, the mixed solution oscillates and diffuses ...
Embodiment 3
[0037] 1. Preparation of two-dimensional ordered polystyrene colloidal arrays
[0038]A single-layer two-dimensional ordered colloidal ball template was prepared by self-assembly technology. The specific steps were: put the silicon wafer substrate in a mixed solution containing ammonia, hydrogen peroxide and water (volume ratio: 1:2:6) for 300 °C for 5-10 minutes, and then ultrasonically cleaned with deionized water and ethanol solution for 2-3 times. Soak it in 2% sodium lauryl sulfate solution for 24 hours to obtain a hydrophilic substrate surface. Take polystyrene solution and ethanol solution with a volume ratio of 1:1 and mix them, ultrasonically oscillate for 5s, then take an appropriate amount of the mixed solution and drop it on the silicon wafer substrate after hydrophilic treatment. Immerse in a container with a concentration of 12-15mmol / L NaCl saline solution. Under the action of the surface tension of the brine, the mixed solution oscillates and diffuses with the...
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