Unlock instant, AI-driven research and patent intelligence for your innovation.

Dendritic polyphenyl substituted adamantane derivative monomolecular resin, positive photoresist composition and negative photoresist composition

A positive photoresist and negative photoresist technology, applied in optics, optomechanical equipment, instruments, etc., can solve the problem of large molecular volume, insufficient lithography pattern resolution and edge roughness, molecular weight polydispersity, etc. question

Active Publication Date: 2020-04-24
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to structural limitations such as the large molecular volume of the polymer resin itself, the polydispersity of the molecular weight, and the entanglement of molecular chains, the resolution and edge roughness of the lithography pattern cannot meet the requirements of fine scribe lines.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Dendritic polyphenyl substituted adamantane derivative monomolecular resin, positive photoresist composition and negative photoresist composition
  • Dendritic polyphenyl substituted adamantane derivative monomolecular resin, positive photoresist composition and negative photoresist composition
  • Dendritic polyphenyl substituted adamantane derivative monomolecular resin, positive photoresist composition and negative photoresist composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] The synthetic route for preparing 1,3,5,7-tetrakis-(3,5-dibromophenyl)adamantane is as follows:

[0058]

[0059] Concrete steps: Add 5.0g (i.e. 11.0mmol) tetrabromoadamantane and 20mL (i.e. 165mmol) m-dibromobenzene in a 250ml three-neck flask equipped with a condenser tube, connect an inverted funnel to 30% from the upper end of the condenser tube with a conduit NaOH aqueous solution to absorb the HBr produced by the reaction. Under the cold water bath at 5°C, add 1.2g (ie 4.5mmol) of AlBr to the reaction system 3 , continue to stir and react under the cold water bath for 1 hour, then remove the cold water bath, return to room temperature and react for about 3 hours, and finally the reaction system is heated to 60°C in the oil bath for 4 hours, the reaction solution is cooled to room temperature, and poured into 100mL acidic ice Stir in water for 1h. After the ice melted completely, add 100ml of dichloromethane to the mixture for extraction, wash the organic laye...

Embodiment 2

[0061] The preparation of 1,3,5,7-tetra-[3,5-bis(3,4-dimethoxyphenyl)-phenyl]adamantane, the synthetic route is as follows:

[0062]

[0063] Specific steps:

[0064] Under the protection of high-purity nitrogen, in the Schleck reaction flask of 100ml, add the 1,3,5,7-tetra-(3,5-dibromophenyl) adamantane of 1071.0mg (being 1mmol), 36.6mg (being 0.05mmol ) PdCl 2 (dppf), 1.82g (i.e. 10.0mmol) 3,4-dimethoxyphenylboronic acid, 581mg (i.e. 10mmol) of potassium fluoride solid, the system was under a nitrogen atmosphere, and finally 20ml of distilled dioxane was added , the reaction solution was heated to reflux for 6h, cooled to room temperature, and extracted with dichloromethane / water, the organic layers were combined, dried over anhydrous sodium sulfate, concentrated under reduced pressure to remove the solvent, and recrystallized in ethyl acetate / n-hexane to obtain a white solid 1.16g , yield 76%. 1 H NMR (400MHz, CDCl 3 )δ(ppm)7.81(s,8H,benzene),7.38(s,4H),7.19-7.08 (m,...

Embodiment 3

[0066] The preparation of 1,3,5,7-tetra-[3,5-bis(3,4-dihydroxyphenyl)-phenyl]adamantane, the synthetic route is as follows:

[0067]

[0068] Specific steps:

[0069] Add 1.53g (i.e. 1.0mmol) of 1,3,5,7-tetra-[3,5-bis(3,4-dimethoxyphenyl)-phenyl]adamantane and Dissolve 50ml of dichloromethane under a nitrogen atmosphere. At a low temperature of -78°C, add 10ml of boron tribromide-containing dichloromethane solution (concentration: 0.4g / ml) dropwise to the reaction solution with a syringe, and the reaction solution is kept at -78°C After reacting for 1 hour, the temperature was gradually raised to room temperature, and the reaction was continued for 6 hours. The reaction was quenched by slowly adding 20 ml of ice water to the reaction system, and a large amount of white solid was precipitated. The reaction system was filtered to obtain a white solid, which was washed with water and dichloromethane respectively to obtain The solid was precipitated three more times with metha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
molecular weightaaaaaaaaaa
glass transition temperatureaaaaaaaaaa
Login to View More

Abstract

The invention discloses a dendritic polyphenyl-substituted adamantane derivative monomolecular resin. The resin has a molecular structure shown in the description. The substituents Ra1-Ra28 in the formula (I), substituents Rb1-Rb21 in the formula (II) and substituents Rc1-Rc14 in the formula (III) independently represent a hydrogen atom, a hydroxyl group, a methoxy group or an acid-sensitive substituent. The substituents Ra1-Ra28 in the formula (I) are the same or different, the substituents Rb1-Rb21 in the formula (II) are the same or different and the substituents Rc1-Rc14 in the formula (III) are the same or different. Multiple substituents on the same benzene ring cannot represent a hydrogen atom at the same time. The dendritic polyphenyl-substituted adamantane derivative monomolecular resin has good solubility in various polar solvents, can be processed into a thin film, has a high glass transition temperature and can meet the requirements of lithography.

Description

technical field [0001] The invention relates to the field of material technology. More specifically, it relates to a dendritic polyphenyl substituted adamantane derivative monomolecular resin, a positive photoresist composition and a negative photoresist composition. Background technique [0002] Photoresist, also known as photoresist, is a kind of etch-resistant thin film material whose solubility changes after energy radiation such as beam, electron beam, ion beam or x-ray, and is widely used in integrated circuits and semiconductor discrete devices. microfabrication. By coating the photoresist on the surface of a semiconductor, conductor or insulator, the part left after exposure and development will protect the bottom layer, and then use an etchant to etch to transfer the required fine pattern from the mask to the substrate. Therefore, photoresist is a key material in device microfabrication technology. [0003] With the rapid development of the semiconductor industry...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C07C69/96C07C68/06C07D309/12G03F7/039G03F7/038
CPCC07C69/96C07D309/12G03F7/038G03F7/039
Inventor 陈金平李嫕于天君曾毅
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI