A leveling device and leveling method for projection objective lens of lithography machine
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A technology of projection objective lens and leveling device, applied in the field of lithography, can solve problems such as poor adjustment effect and small adjustment range, and achieve the effects of reducing response, improving detection performance, and suppressing low-frequency vibration
Active Publication Date: 2018-11-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0006] The invention provides a leveling device and a leveling method for the projection objective lens of a lithography machine, so as to solve the problems of small adjustment range and poor adjustment effect in the prior art
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[0035] The present invention is described in detail below in conjunction with accompanying drawing:
[0036] Such as Figure 1-2As shown, the present invention provides a leveling device for the projection objective lens of a lithography machine, including a workbench 1, a suspension frame 2 for supporting the workbench 1, and a suspension frame support for supporting the suspension frame 2 3. The installation substrate 4 arranged above the suspension frame support 3, the objective lens frame 5 arranged on the described installation substrate 4, the photoelectric measuring system 6 and at least one projection objective lens 7 installed on the objective lens frame 5, the The leveling device also includes a sensor measurement system 8 connected to the surface of the objective lens frame 5, an active damper 9 arranged on the mounting substrate 4 and connected to the objective lens frame 5, and located below the active damper 9. The vertical adjustment mechanism 10, and the contr...
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Abstract
The invention discloses a leveling device and leveling method of a photoetching machine projection objective. The leveling device comprises a workbench, a hanging frame, a hanging frame support, an installation base plate, an objective frame, a photoelectric measurement system, a projection objective, a sensor measurement system, an active damper, a vertical adjustment mechanism and a controller, wherein the hanging frame is used for supporting the workbench, the hanging frame support is used for supporting the hanging frame, the installation base plate is arranged above the hanging frame support, the objective frame is arranged on the installation base plate, the photoelectric measurement system and the projection objective are arranged on the objective frame, the sensor measurement system is connected with a surface of the objective frame, the active damper is arranged on the installation base plate and is connected with the objective frame, the vertical adjustment mechanism is arranged below the active damper, and the controller is electrically connected with the sensor measurement system, the active damper and the vertical adjustment mechanism. By the leveling device, the purpose that the projection objective and the photoelectric measurement system are free from influence of external vibration and impact is achieved, meanwhile, the projection objective and the photoelectric measurement system are maintained in a static state relative to the position of the hanging frame of a support workpiece table all the way, the exposure imaging quality of the projection objective and the detection performance of the photoelectric measurement system are improved.
Description
technical field [0001] The invention relates to the technical field of lithography, in particular to a leveling device and a leveling method for a projection objective lens of a lithography machine. Background technique [0002] In today's information society, the rapid development of display technology makes it play an increasingly important role in people's lives. At the same time, people's requirements for displays are getting higher and higher. The latest OLED (Organic Light-Emitting Diode, organic light-emitting display) has the advantages of ultra-thin, active luminescence, high brightness, high contrast, wide viewing angle, wide operating temperature range, low power consumption, low cost, and all solid-state, and will provide people with It provides a more ideal display screen and has a huge impact on the existing display industry structure. It is also considered to be the most powerful competitor of LCD (Liquid Crystal Display, liquid crystal display). The product...
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Application Information
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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70258G03F7/70833G03F7/7085
Inventor 杨玉杰
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD