A leveling device and leveling method for projection objective lens of lithography machine
A technology of projection objective lens and leveling device, applied in the field of lithography, can solve problems such as poor adjustment effect and small adjustment range, and achieve the effects of reducing response, improving detection performance, and suppressing low-frequency vibration
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[0035] The present invention is described in detail below in conjunction with accompanying drawing:
[0036] Such as Figure 1-2As shown, the present invention provides a leveling device for the projection objective lens of a lithography machine, including a workbench 1, a suspension frame 2 for supporting the workbench 1, and a suspension frame support for supporting the suspension frame 2 3. The installation substrate 4 arranged above the suspension frame support 3, the objective lens frame 5 arranged on the described installation substrate 4, the photoelectric measuring system 6 and at least one projection objective lens 7 installed on the objective lens frame 5, the The leveling device also includes a sensor measurement system 8 connected to the surface of the objective lens frame 5, an active damper 9 arranged on the mounting substrate 4 and connected to the objective lens frame 5, and located below the active damper 9. The vertical adjustment mechanism 10, and the contr...
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