Novel positive ion photo curing system and application of composition of photo curing system

A cationic, photocuring technology, applied in applications, photosensitive materials for optomechanical equipment, optics, etc., can solve the problems of poor absorption capacity of LED light sources and difficult curing.

Active Publication Date: 2017-10-27
CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing cationic light-curing system has poor absorption ability to LED light source and is often difficult to cure

Method used

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  • Novel positive ion photo curing system and application of composition of photo curing system
  • Novel positive ion photo curing system and application of composition of photo curing system
  • Novel positive ion photo curing system and application of composition of photo curing system

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Experimental program
Comparison scheme
Effect test

preparation example Construction

[0071]

[0072] The photocurable composition of the present invention can be obtained by weighing each component according to the amount and mixing them uniformly.

[0073] At this stage, the commercially available products in the field of cationic photocuring are mainly imported. Most of these products have patented technology and high product prices. However, domestic companies lack core technology and independent intellectual property rights. Under strict technical barriers, enterprise development and even R&D layout are difficult. was greatly restricted. Through component optimization, the photocurable composition obtained by the present invention has a large photosensitive wavelength range and good photocuring effect, can be applied in many aspects such as paints, coatings, inks, molding materials, etc., and has strong technical and market competitiveness.

specific Embodiment approach

[0074] The present invention will be described in further detail below in conjunction with specific examples, but they should not be construed as limiting the protection scope of the present invention.

[0075] Unless otherwise specified, the parts described below are all parts by weight. The meaning of each abbreviation is as follows:

[0076] A1:

[0077] A2:

[0078] A3:

[0079] A4:

[0080] B1: bisphenol A epoxy resin (DGEBA)

[0081] B2: 4-Hydroxybutyl vinyl ether (HBVE)

[0082] B3: 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexyl carboxylate

[0083] B4: Triethylene glycol divinyl ether

[0084] C1:

[0085] C2:

[0086] 1. Preparation of photocurable composition

[0087] The photocurable composition was prepared according to the formula shown in Table 1 below.

[0088] Table 1

[0089]

[0090]

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PUM

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Abstract

The invention discloses a novel positive ion photo curing system. The novel positive ion photo curing system comprises an anthracene ester sensitizer which is selected from a compound with the structure as shown in the formula (1) and/or a macromolecular compound taking the compound as shown in the formula (1) as the main structure, a positive ion reaction type compound and a positive ion type photoinitiator. Compared with the conventional positive ion photo curing system, the composition is low in cost, and has extremely high response to the light source within the wavelength range of 200-500nm, high curing speed, excellent developing and picture completeness, high curing film hardness, and strong adhesive force on a substrate, can be applied in the fields of oil paint, coating, printing ink, a forming material and the like, and has relatively high technological and market competitiveness.

Description

technical field [0001] The invention belongs to the technical field of organic photocuring, and in particular relates to a cationic photocuring composition and its application in the field of photocuring. Background technique [0002] Cationic photocuring has the characteristics of not easy oxygen inhibition, small volume shrinkage during curing, good substrate adhesion, strong post-curing, low odor, etc., and has received more and more attention in the field of photocuring. Like other photocuring systems, the initiation lamp source of the existing cationic photocuring system is mainly a high-pressure mercury lamp (usually in the wavelength range of 200-360nm). However, the practical application shows that most of the existing cationic photocuring systems have small quantum absorption rate, low photocuring rate and incomplete curing under high-pressure mercury lamps. The only few systems with good curing effects also have complex components and high costs. insufficient. In...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/031G03F7/004C09D11/101
CPCC09D11/101G03F7/004G03F7/031C08L63/00
Inventor 钱晓春胡春青
Owner CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
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