Stress detection device and method based on Mueller matrix

Abstract

The embodiment of the invention relates to a stress detection device and method based on a Mueller matrix. The device comprises following optical devices: a light source, a polarizer, a first phase compensator, a to-be-detected optical material, a second phase compensator, a polarization analyzer and a photo-detector, which are arranged in the propagation direction of the light. The above optical devices are represented by the Mueller matrix, and based on an operation relation of the Mueller matrix of the light through the above optical devices, reversely solving Mueller matrix elements of the to-be-detected optical material. Parts of the Mueller matrix elements of the to-be-detected optical material in the Mueller matrix represent the stress of the to-be-detected optical material. According to the invention, stress of the material can be quantitatively measured; the accuracy, the sensitivity and the resolution are high; and the measurement is reliable and quick.

Description

technical field [0001] The present invention relates to the field of stress detection, and more specifically relates to a Mueller matrix-based optical stress detection device and method, and using the method for manufacturing and / or screening optical devices. Background technique [0002] Optical lens is the core component in optical measurement, and it is indispensable in the measurement of small areas. The stress of the lens is an important factor affecting its performance. The stress will affect the optical properties of the lens, such as refractive index, uniformity and surface shape, so that the performance and quality of the beam passing through the lens deviate from the ideal design situation, which is the design and factors that must be considered in the optimization process. [0003] Especially in some high-precision measurements, such as ellipsometer measurement is particularly important. Ellipsometer measurement is to obtain the film thickness and refractive ind...

AI Technical Summary

Problems solved by technology

If the lenses cut from the same piece of material are treated with the same quality, the stress of the produced lenses will be different, and the quality of the lenses cannot be controlled.

[0006] Non-destructive methods for measuring material stress generally include photoelastic method, X-ray method, ultrasonic method, etc. Generally, these methods are semi-qualitative and semi-quantitative, and cannot accurately obtain the stress of the material. In the case of very thin stress and small stress, the sensitivity resolution is not enough

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