Substrate cleaning method and film forming method

Abstract

The invention provides a substrate cleaning method and a film forming method. The substrate cleaning method provided by the invention comprises the steps that a substrate is pre-cleaned; a super-amphiphobic film layer is formed on the substrate; and finally, the substrate is washed with water in the latter stage. The lyophobic and oleophobic super-amphiphobic film layer is formed on the pre-cleaned substrate to avoid the problems of subsequent water marks and oil pollution. The cleanliness of the substrate before film forming is improved. The film forming quality can be effectively improved. The product yield is improved. The electrical properties of the substrate are not impacted. According to the film forming method provided by the invention, the substrate cleaning method is used to clean the substrate before film forming; the cleanliness of the substrate before film forming is improved; the film forming quality can be effectively improved; the product yield is improved; and the electrical properties of the substrate are not impacted.

Description

technical field [0001] The invention relates to the technical field of display panel manufacturing, in particular to a substrate cleaning method and a film forming method. Background technique [0002] In the field of display technology, flat-panel displays such as Liquid Crystal Display (LCD) and Organic Light Emitting Diode (OLED) have gradually replaced CRT displays, and are widely used in LCD TVs, mobile phones, personal digital assistants, digital Cameras, computer or laptop screens, etc. [0003] The display panel is an important part of LCD and OLED. Whether it is an LCD display panel or an OLED display panel, it usually has a thin film transistor (Thin Film Transistor, TFT) array substrate. Taking the LCD display panel as an example, it is mainly composed of a TFT array substrate, a color filter substrate (Color Filter, CF), and a liquid crystal layer (Liquid Crystal Layer) arranged between the two substrates. Its working principle The rotation of the liquid cryst...

AI Technical Summary

Problems solved by technology

[0013] 1. Water mark problem: The substrate passes through many wet units before film formation. If the final drying process is not sufficient, moisture will remain on the substrate, and water marks and foreign objects will be formed after film formation, which will affect the yield rate;

[0014] 2. Oil pollution problem: the substrate is transported through a long path before film formation, and it is easy to drop oil stains on the substrate, and it is easy to cause wrinkles after film formation, which will also affect the yield

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