Anisotropic link construct
An anisotropic and structural technology, which is applied in the manufacture of printed circuits, printed circuits connected with non-printed electrical components, printed circuits, etc. Achieving the effect of suppressing the rise in on-resistance
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Embodiment 1
[0088] First, a polyimide substrate (flexible substrate) having a film thickness of 0.3 mm on which Ti / Al electrodes having a height of 20 μm (the layout of the electrodes is the same as the bump layout of an IC chip described later) formed thereon was prepared. In addition, assuming that bending is performed with a bending diameter of 10000 μm in the X direction, an IC chip (electronic component) having a length of 25 mm in the X direction×2 mm in the Y direction and a thickness of 0.3 mm was prepared. Here, gold-plated bumps having a length of 25 μm in the X direction×50 μm in the Y direction and a height of 20 μm were formed on the IC chip.
[0089] Next, an anisotropic conductive film (CP6920F3 manufactured by Japan Dexerials Co., Ltd., with an average thickness of 25 μm and an average particle diameter of conductive particles of 3 μm) was pasted as an anisotropic conductive adhesive on the polyimide substrate formed with Ti / Al electrode face.
[0090] Next, the IC chip ...
Embodiment 2
[0092] An anisotropic connection structure according to Example 2 was produced in the same manner as in Example 1 except that an IC chip having gold-plated bumps formed with a length of 20 μm in the X direction×50 μm in length in the Y direction was used.
Embodiment 3
[0094] An IC chip formed with a gold-plated bump (70 μm in length in the X direction x 50 μm in length in the Y direction as a whole) having three convex portions of 20 μm in length in the X direction x 50 μm in length in the Y direction was used. The anisotropic bonded structure according to Example 3 was produced in the same manner as in Example 1 except that there was a groove (depth: 10 μm) between the X directions with a length of 5 μm.
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