Duoplasmatron-ion-source discharge power supply

Abstract

The invention discloses a duoplasmatron-ion-source discharge power supply. The duoplasmatron-ion-source discharge power supply comprises a phase shift PWM (pulse-width modulation) control circuit, a rectifier and filter circuit, a full-bridge inverter circuit and boosting transformer; the phase shift PWM control circuit is a control end of the power supply and is used for moderating duty cycle ofsignal output waveform in a phase shift mode by receiving feedback signals of output voltage and output current; a 0V and 50HZ alternating current is converted into a 300V direct current through the rectifier and filter circuit; the 300V direct current is converted into a 300V alternating current through the full-bridge inverter circuit according to output signals of the phase shift PWM control circuit; the 300V alternating current outputted by the full-bridge inverter circuit is raised to an alternating current of about 5000V through the boosting transformer; the power supply outputs currentand voltage and feeds back to the phase shift PWM control circuit. By the arrangement, the problem that a constant voltage / constant current power supply cannot meet needs of duoplasmatron ion sourcesdue to reasons of small adjustment range of output voltage and output current, low power, power supply running modes and the like is solved; the power supply applied to the duoplasmatron ion sources enables experiments of secondary-ion mass spectrometry more efficient.

Description

technical field [0001] The invention relates to the field of plasma power supplies, in particular to a dual plasma ion source discharge power supply. Background technique [0002] Secondary ion mass spectrometer is a scientific instrument for detecting the composition and content of samples. It has ultra-high sensitivity and mass resolution, and is widely used in analytical chemistry, environmental science, life science, geological science and other fields. The principle is that the focused primary ion beam bombards the surface of the sample to sputter secondary ions, and the secondary ions are generated into the mass analyzer, and the mass spectrometry separation is realized according to the mass-to-charge ratio of different ions, so that the element distribution at a certain depth on the sample surface can be known. and composition. [0003] The dual plasma ion source is the most commonly used ion source for secondary ion mass spectrometry, which can provide O - , O 2 ...

AI Technical Summary

Problems solved by technology

[0013] The technical problem to be solved by the present invention is to provide a dual plasma ion source discharge power supply, which solves the problems of other disclosed discharge power supplies, such as the small output voltage and output current adjustment range, low power, and the working mode of the power supply. Plasma Ion Source Needs

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