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264 results about "Secondary ion mass spectrometry" patented technology

Secondary-ion mass spectrometry (SIMS) is a technique used to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions. The mass/charge ratios of these secondary ions are measured with a mass spectrometer to determine the elemental, isotopic, or molecular composition of the surface to a depth of 1 to 2 nm. Due to the large variation in ionization probabilities among different materials, SIMS is generally considered to be a qualitative technique, although quantitation is possible with the use of standards. SIMS is the most sensitive surface analysis technique, with elemental detection limits ranging from parts per million to parts per billion.

Single crystal CVD synthetic diamond material

A single crystal CVD synthetic diamond material comprising: a total as-grown nitrogen concentration equal to or greater than 5 ppm, and a uniform distribution of defects, wherein said uniform distribution of defects is defined by one or more of the following characteristics: (i) the total nitrogen concentration, when mapped by secondary ion mass spectrometry (SIMS) over an area equal to or greater than 50×50 μm using an analysis area of 10 μm or less, possesses a point-to-point variation of less than 30% of an average total nitrogen concentration value, or when mapped by SIMS over an area equal to or greater than 200×200 μm using an analysis area of 60 μm or less, possesses a point-to-point variation of less than 30% of an average total nitrogen concentration value; (ii) an as-grown nitrogen-vacancy defect (NV) concentration equal to or greater than 50 ppb as measured using 77K UV-visible absorption measurements, wherein the nitrogen-vacancy defects are uniformly distributed through the synthetic single crystal CVD diamond material such that, when excited using a 514 nm laser excitation source of spot size equal to or less than 10 μm at room temperature using a 50 mW 46 continuous wave laser, and mapped over an area equal to or greater than 50×50 μm with a data interval less than 10 μm there is a low point-to-point variation wherein the intensity area ratio of nitrogen vacancy photoluminescence peaks between regions of high photoluminescent intensity and regions of low photolominescent intensity is <2× for either the 575 nm photoluminescent peak (NV0) or the 637 nm photoluminescent peak (NV); (iii) a variation in Raman intensity such that, when excited using a 514 nm laser excitation source (resulting in a Raman peak at 552.4 nm) of spot size equal to or less than 10 μm at room temperature using a 50 mW continuous wave laser, and mapped over an area equal to or greater than 50×50 μm with a data interval less than 10 μm, there is a low point-to-point variation wherein the ratio of Raman peak areas between regions of low Raman intensity and high Raman intensity is <1.25×; (iv) an as-grown nitrogen-vacancy defect (NV) concentration equal to or greater than 50 ppb as measured using 77K UV-visible absorption measurements, wherein, when excited using a 514 nm excitation source of spot size equal to or less than 10 μm at 77K using a 50 mW continuous wave laser, gives an intensity at 575 nm corresponding to NV0 greater than 120 times a Raman intensity at 552.4 nm, and/or an intensity at 637 nm corresponding to NV greater than 200 times the Raman intensity at 552.4 nm; (v) a single substitutional nitrogen defect (Ns) concentration equal to or greater than 5 ppm, wherein the single substitutional nitrogen defects are uniformly distributed through the synthetic single crystal CVD diamond material such that by using a 1344 cm−1 infrared absorption feature and sampling an area greater than an area of 0.5 mm2, the variation is lower than 80%, as deduced by dividing the standard deviation by the mean value; (vi) a variation in red luminescence intensity, as defined by a standard deviation divided by a mean value, is less than 15%; (vii) a mean standard deviation in neutral single substitutional nitrogen concentration of less than 80%; and (viii) a colour intensity as measured using a histogram from a microscopy image with a mean gray value of greater than 50, wherein the colour intensity is uniform through the single crystal CVD synthetic diamond material such that the variation in gray colour, as characterised by the gray value standard deviation divided by the gray value mean, is less than 40%.
Owner:ELEMENT SIX LTD

Depth profile metrology using grazing incidence X-ray fluorescence

For small angles that are near critical angle, a primary incident X-ray beam has excellent depth resolution. A series of X-ray fluorescence measurements are performed at varying small angles and analyzed for depth profiling of elements within a substrate. One highly useful application of the X-ray fluorescence measurements is depth profiling of a dopant used in semiconductor manufacturing such as arsenic, phosphorus, and boron. In one example, angles are be varied from 0.01° to 0.20° and measurements made to profile arsenic distribution within a semiconductor wafer. In one embodiment, measurements are acquired using a total reflection X-ray fluorescence (TXRF) type system for both known and unknown profile distribution samples. The fluorescence measurements are denominated in counts/second terms and formed as ratios comparing the known and unknown sample results. The count ratios are compared to ratios of known to unknown samples that are acquired using a control analytical measurement technique. In one example the control technique is secondary ion mass spectroscopy (SIMS) so that the count ratios from the TXRF-type measurements are compared to ratios of integrals of SIMS profiles. In another example, the TXRF-type measurement ratios are compared to simulation profiles of known samples. Integrals of the SIMS profile that vary as a function of depth into the substrate correspond to the grazing incidence angles of the TXRF-like measurement and respective count rates.
Owner:ADVANCED MICRO DEVICES INC

Method for preparing high-resolution emitter tungsten tip and device thereof

The invention discloses a method for preparing a high-resolution emitter tungsten tip and a device thereof, and relates to a liquid metal ion source with high-resolution secondary ion mass spectrometry (SIMS). The invention provides the method for rapidly and safely preparing the emitter tungsten tip with simpleness and high repeatability. The device is provided with an AC voltage signal generating circuit, a corrosion current monitoring circuit, a corrosion voltage monitoring circuit, an automatic corrosion control system, a spiral micro-regulator, a corrosion electrolytic cell and a constant temperature control system. Corrosion solution is placed in a cooler for low-temperature cooling before the manufacture and taken out till a certain temperature, then the cooler with the corrosion solution is horizontally fixed in the constant temperature controller, and the constant temperature control system is regulated for keeping the temperature of the corrosion solution at constant temperature. A clean tungsten wire is taken and annealed by hydrogen flame, one end of the tungsten wire is fixed on the spiral micro-device and used as a pole, and the other pole is a metal annular electrode placed in the NaOH corrosion solution; the metal annular electrode is horizontally placed at the middle and lower part at the bottom of the corrosion electrolytic cell; a central point of the metal annular electrode is taken by the tungsten wire and vertically inserted in the corrosion solution; the tungsten wire is inserted in the corrosion solution, and the insertion depth is kept; the corrosion current is monitored till the corrosion current achieves a threshold; pulse corrosion is continued, and roughening treatment is carried out on the tip, and the length to width ratio of the tip is controlled.
Owner:CHINA UNIV OF MINING & TECH (BEIJING)

Combined system of super-resolution confocal optical microscope and secondary ion mass spectroscopy

The invention discloses a combined system of a super-resolution confocal optical microscope and a secondary ion mass spectroscopy. According to the combined system, laser output by a laser device a is filtered by a dichroic optical filter a and is converged to a microscope objective; laser output by a laser device b is filtered by a phase plate and a dichroic optical filter b in sequence and then is converged to the microscope objective; the laser converged by the microscope objective irradiates a sample platform to obtain a fluorescence signal of a sample to be detected; the laser is converged by the microscope objective, is collected by a collection lens a, and then is emitted into a photoelectric detector; a photoelectric signal output by the photoelectric detector is input to an optical signal acquisition device; the sample to be detected is bombarded by an ion beam generator to obtain secondary ions; after passing through a pull-out electrode to obtain kinetic energy, the secondary ions are screened by an ion gate and are detected by a reflection detector; a signal output by the reflection detector is input into an SIMS (Secondary Ion Mass Spectroscopy) signal acquisition device; the ion beam generator and the sample platform are connected with a displacement controller. According to the combined system, SIMS imaging and analysis are guided by super-resolution optical imaging; the resolution of the super-resolution confocal optical microscope can be close to that of the SIMS so that the high-precision target spot positioning can be realized.
Owner:INNOVATIVE SEMICON SUBSTRATE TECH CO LTD
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