Method for preparing abrasion-resistance high-hydrolysis-resistance negative-pressure texture-absorbing molded solvent-free polyurethane synthetic leather

A solvent-free polyurethane and hydrolysis-resistant technology, which is applied in textiles and papermaking, can solve problems such as low temperature conditions, fullness, and unfavorable finished patterns, and achieve high production efficiency, scratch resistance, and strong three-dimensional patterns

Inactive Publication Date: 2018-01-19
ANHUI ANLI MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The patent pointed out that the vacuum embossing temperature is 40-50°C, but this temperature condition is relatively low, which is not conducive to the fullness of the finished pattern

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] In this embodiment, the preparation method of the wear-resistant, highly hydrolysis-resistant negative pressure pattern-absorbing molded solvent-free polyurethane synthetic leather is as follows:

[0044] 1. Preparation of surface layer

[0045] Mix 1 part by mass of wear-resistant additive Silok-3300, 0.2 parts by mass of wetting agent 9565, 8 parts by mass of pigment paste, 90 parts by mass of environmentally friendly closed high-solid polycarbon polyurethane resin GS-9040 and 5 parts by mass of environmentally friendly weak The solvent propylene glycol methyl ether acetate is mixed evenly and then vacuumized to obtain the polyurethane resin surface layer slurry; the polyurethane resin surface layer slurry is evenly coated and scraped on the front of the release paper with a thickness of 0.15mm, and air-dried at 130°C Cook for 2 minutes to obtain the surface layer.

[0046] 2. Preparation of solvent-free foaming layer

[0047]Add the solvent-free component A and com...

Embodiment 2

[0056] In this embodiment, the preparation method of the wear-resistant, highly hydrolysis-resistant negative pressure pattern-absorbing molded solvent-free polyurethane synthetic leather is as follows:

[0057] 1. Preparation of surface layer

[0058] 1.2 parts by mass of wear-resistant additive Silok-4400H, 0.4 parts by mass of wetting agent Silok-8008, 9 parts by mass of pigment paste, 95 parts by mass of environmentally friendly closed high-solid content polycarbonate polyurethane resin GS-9040 and 3 parts by mass of The environmentally friendly weak solvent propylene glycol methyl ether acetate is mixed evenly and then vacuumized to obtain a polyurethane resin surface layer slurry; the polyurethane resin surface layer slurry is evenly coated on the front of the release paper with a thickness of 0.10mm and drummed at 130°C Air-dried and matured for 2 minutes to obtain the surface layer.

[0059] 2. Preparation of solvent-free foaming layer

[0060] Add the solvent-free c...

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Abstract

The invention discloses a method for preparing abrasion-resistance high-hydrolysis-resistance negative-pressure texture-absorbing molded solvent-free polyurethane synthetic leather. The synthetic leather is prepared by selecting abrasion-resistance scraping-resistance closed high-solid-content poly-carbon type polyurethane resin as a dry-method surface layer and high-hydrolysis-resistance solvent-free polyurethane resin as a foaming layer through low-pressure pouring equipment and adhering to a cloth base; and molding textures of the synthetic leather by adopting a negative pressure texture absorbing process. The negative-pressure texture-absorbing molded solvent-free polyurethane synthetic leather has the characteristics of efficient and environment-friendly preparation process, no DMF, strong texture solid feeling, plump and soft hand feeling, excellent genuine leather effect, abrasion resistance (Valspar is 0.3 million times), super hydrolysis resistance (8-12 years) and other highphysical performances.

Description

technical field [0001] The invention relates to a preparation method of wear-resistant and highly hydrolysis-resistant solvent-free polyurethane synthetic leather formed by negative pressure absorbing lines, and belongs to the technical field of functional polyurethane synthetic leather. Background technique [0002] With the improvement of people's living standards in recent years, consumers have also increased their requirements for the performance of polyurethane synthetic leather. On the one hand, they have higher requirements on the durability of products, and on the other hand, they also favor the environmental protection performance of products. New materials such as solvent-free polyurethane synthetic leather have gradually begun to replace traditional all-solvent polyurethane synthetic leather due to their environmental protection, high physical properties, low processing energy consumption, and fewer production processes. Conventional solvent-free polyurethane is a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D06N3/14D06N3/00
Inventor 梁光波孙心如李晓飞王锐林叶奇泉王海峰王燕武黄万里
Owner ANHUI ANLI MATERIAL TECH
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