Physical vapor deposition equipment and physical vapor deposition method

Abstract

The invention discloses physical vapor deposition equipment and a physical vapor deposition method. The physical vapor deposition equipment comprises a shell, a transmitting source, a bearing device and a power device. A vacuum coating chamber is formed in the shell, the transmitting source, the bearing device and the power device are located in the vacuum coating chamber, and the power device isconnected to the bearing device so that a to-be-coated product located on the bearing device can vibrate up and down, overturn from interior to exterior and rotate in the preset direction. When the physical vapor deposition equipment conducts coating, the step that a large amount of manual work is needed for manual hanging is omitted, the machining efficiency is greatly improved, the number of products machined at a time is tens of times of the number of products coated through an ordinary hanging tool manner, the machining cost is greatly reduced, and the automation degree in the coating process is higher; and meanwhile, the to-be-coated product can obtain a complete and comprehensive PVD clad layer, the applicability of the product is obviously improved, and the coating quality is further guaranteed.

Description

technical field [0001] The invention relates to the technical field of product surface coating, in particular to a physical vapor deposition equipment and a physical vapor deposition method. Background technique [0002] At present, with the continuous improvement of living standards and the continuous development of production technology, the demand for the appearance of various products in the market has increased significantly. While the product structure has become more and more refined, the requirements for surface color and hardness have also become higher and higher. This situation has greatly promoted the progress of the Physical Vapor Deposition (Physical Vapor Deposition, PVD) process. Physical vapor deposition has great advantages in surface treatment. It has low requirements on the material of the substrate, no waste gas and waste water discharge, and no pollution to the environment. The biggest advantage is that it can greatly improve the hardness and wear resi...

AI Technical Summary

Problems solved by technology

[0003] However, the existing physical vapor deposition method has the following defects: the physical vapor deposition in the prior art is carried out in a vacuum environment, and the number of products that can be processed in each batch is limited, which limits the processing efficiency of physical vapor deposition

It is not ideal for products with a certain structure or products that require all-round coating

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