Plant root border cell treatment method for nano-SiO2 deposition

Abstract

The invention discloses a plant root border cell treatment method for nano-SiO2 deposition. The method comprises the following process steps: 1) plant seedling root border cells are collected and treated in a CaCl2 solution, and a cell collection solution is obtained; 2) the cell collection solution is transferred into a PE tube and subjected to centrifugal treatment, supernatant is removed, a poly(diallyldimethylammonium chloride) solution with concentration being 0.002% g / L is added, and sufficient adsorption is performed; 3) a poly(sodium-p-styrenesulfonate) solution is added to the solution obtained in step 2), and sufficient adsorption is performed; 4) a PDADMAC / PSS)X-PDADMAC self-assembled multi-layer film is formed on the surfaces of the cells by repeating the steps 2) and 3) as required; 5) adsorption treatment is performed on nano-SiO2 particles, and a finished product is obtained. By combining an electrostatic self-assembly technique with a biomineralization simulation process, the self-assembled multi-layer film can be effectively formed on the surfaces of the plant root border cells and the nano-SiO2 can be deposited, so that a technological base is provided for improvement of the aluminum toxicity resistance of the plant root border cells.

Description

technical field [0001] The invention relates to the field of plant cell treatment, in particular to a plant root edge cell treatment method. Background technique [0002] According to the different parts of detoxification, the physiological mechanism of plant resistance to aluminum toxicity can be divided into two categories: external rejection and internal tolerance. The former detoxification site is in the apoplast, while the latter is the symplast. The external exclusion mechanism includes the fixation of the cell wall to aluminum, the selective permeability of the plasma membrane to aluminum, the induced barrier, the secretion of chelating ligands and phosphate, and the "active transport out of the cell". The internal tolerance mechanism mainly includes The chelation of aluminum by organic acids, proteins and other organic ligands in the cytoplasm, the compartmentalization of vacuoles, the induction of anti-aluminase and the improvement of enzyme activity, etc. In the p...

AI Technical Summary

Problems solved by technology

[0004] Many studies have shown that silicon, as a plant beneficial element, can relieve plant aluminum toxicity, and the silicon oxide deposited on the cell wall, intercellular space and in the cell duct can induce SiO due to the presence of various hydrophilic media. 2 Self-assembled to form SiO 2 Nanostructures, this deposition improves the resistance of the cell wall to external forces, however nanostructured SiO 2 How to effectively deposit in root border cells and endow plant root border cells with better aluminum toxicity resistance remains to be explored

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