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Mask, memory and manufacturing method of memory

A manufacturing method and mask technology, which is applied in the field of memory and memory manufacturing and mask, can solve the problems of difficult registration of mask and lower memory quality, etc., so as to improve registration accuracy, improve quality and reliability Effect

Pending Publication Date: 2018-04-03
CHANGXIN MEMORY TECH INC
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AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a mask, a memory and a method for manufacturing the memory, so as to solve the problem in the prior art that the registration between the masks is difficult, thereby reducing the quality of the formed memory

Method used

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  • Mask, memory and manufacturing method of memory
  • Mask, memory and manufacturing method of memory
  • Mask, memory and manufacturing method of memory

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Embodiment Construction

[0104] First, please refer to figure 1 , which is a structural schematic diagram of a mask for forming a storage node contact in a memory. Such as figure 1 As shown, the mask plate 100 includes: a substrate 110 having a plurality of storage node contact patterns 120 , and the storage node contact patterns 120 are circular.

[0105] Next, please refer to Figure 2 to Figure 8 ,in, figure 2 is adopted figure 1 The schematic top view of the memory after the mask plate forms the contact with the storage node as shown; image 3 yes figure 2 A schematic top view of the substrate in the shown memory; Figure 4 yes figure 2 A schematic cross-sectional view of the substrate along AA' in the shown memory; Figure 5 is in Figure 4 Schematic diagram of the structure after the connection material layer is formed on the shown structure; Figure 6 is in Figure 5 Schematic diagram of the structure after forming the first photoresist layer on the shown structure; Figure 7 is ...

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Abstract

The invention provides a mask, a memory and a manufacturing method of the memory. The mask comprises first linear patterns extending along a first direction and second linear patterns extending alonga second direction, so that registration can be carried out in the first direction and the second direction during registration between the masks, thereby improving the registration accuracy. Furthermore, the masks can be used for forming memory node contacts and capacitors, that is to say, two connected structures can be manufactured by using the masks with the same patterns during manufacturingof the memory, so that the registration accuracy of the masks in front and back two steps can be further improved, thereby improving the quality and the reliability of the formed memory.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a mask plate, a memory and a method for manufacturing the memory. Background technique [0002] In the field of semiconductor manufacturing, photolithography is used to transfer a pattern from a mask to a substrate. A mask, also called a photolithography plate, mask plate, or reticle, is a For the flat plate with light transmission for exposure light, there is a design pattern with light shielding for exposure light on it, which can selectively block the light irradiated on the photoresist layer or mask layer on the surface of the substrate, and finally on the substrate Corresponding patterns are formed on the photoresist layer or the mask layer on the bottom surface. [0003] Memory manufacturing is a very important piece of the field of semiconductor manufacturing. A memory generally includes a capacitor and a transistor, wherein the capacitor is used to s...

Claims

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Application Information

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IPC IPC(8): G03F1/42H01L27/108
CPCG03F1/42H10B12/01H10B12/00
Inventor 不公告发明人
Owner CHANGXIN MEMORY TECH INC
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