Mask, memory and manufacturing method of memory
A manufacturing method and mask technology, which is applied in the field of memory and memory manufacturing and mask, can solve the problems of difficult registration of mask and lower memory quality, etc., so as to improve registration accuracy, improve quality and reliability Effect
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[0104] First, please refer to figure 1 , which is a schematic structural diagram of a mask for forming a contact between storage nodes in a memory. like figure 1 As shown, the mask 100 includes: a substrate 110, the substrate 110 has a plurality of storage node contact patterns 120, and the storage node contact patterns 120 are circular.
[0105] Next, please refer to Figure 2 to Figure 8 ,in, figure 2 is to adopt figure 1 The schematic top view of the memory after the reticle forms the storage node contact as shown; image 3 Yes figure 2 A schematic top view of the substrate in the memory shown; Figure 4 Yes figure 2 A schematic cross-sectional view of the substrate along AA' in the memory shown; Figure 5 is in Figure 4 The schematic diagram of the structure after forming the connection material layer on the structure shown; Image 6 is in Figure 5 The schematic diagram of the structure after the first photoresist layer is formed on the structure shown; F...
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