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Method and apparatus for the cleaning and coating of metal strip

A metal strip and coating technology, applied in chemical instruments and methods, metal material coating process, preparation of detergent mixture compositions, etc., can solve problems such as contamination of deposition chambers, and achieve the effect of easy maintenance and easy provision.

Inactive Publication Date: 2018-04-17
TATA STEEL NEDERLAND TECH BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] However, the main problem with all these cleaning methods is that residues from the sputtered layer will inevitably contaminate the deposition chamber

Method used

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  • Method and apparatus for the cleaning and coating of metal strip
  • Method and apparatus for the cleaning and coating of metal strip
  • Method and apparatus for the cleaning and coating of metal strip

Examples

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Embodiment 1

[0056] This example describes tests performed to investigate the effect of gas bearings on strips that were activated and cleaned. For this purpose, first use 200kJ / m 2 A magnetron sputtering unit operated at a power density of 5·10 -4 The strip is cleaned in a roll-to-roll batch chamber at an operating pressure of mbar. The strip is cleaned / activated and heated using a magnetron sputtering unit. From a cleaning and activation point of view, >40kJ / m 2 The cleaning density is sufficient. After cleaning, the steel strip is coiled and the pressure in the chamber is increased with argon, nitrogen or dry air to a pressure in the range of 0.1 to 5 mbar. This is done while the booster and Roots pump are still on to maximize gas flow through the deposition chamber. The coil is then unwound for a period of time in this increased atmosphere, causing the gas atoms to bombard the strip, and the same happens when the activated strip passes through the gas bearing lock. Finally, a 3 μ...

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Abstract

The invention relates to a method and an apparatus for cleaning and coating a metal strip wherein the metal strip is cleaned in a cleaning chamber connected to a deposition chamber and wherein the vacuum pressure in the cleaning chamber is kept in the range of 0.01 - 100 mbar and the vacuum pressure in the deposition chamber in the range of 0.01 - 10 mbar.

Description

technical field [0001] The invention relates to a plant for cleaning and coating metal strips, wherein the cleaning is performed by a plasma treatment process and the coating is applied by a vacuum vapor deposition process. Vacuum vapor deposition includes physical vapor deposition (PVD) and chemical vapor deposition (CVD), and although the term PVD will be used throughout this specification, it means both PVD and CVD as applicable. Background technique [0002] An important issue in applying coatings by PVD on metal substrates (e.g. steel strip) on an industrial scale is to maintain the vacuum required for the PVD process and to keep the deposition chamber in which the coating is applied to the strip as free as possible. Infected. Contamination of the deposition chamber can be produced by coating vapors instead of metal strip deposits on the chamber walls. Another form of contamination is residue from cleaning metal strip. [0003] A continuous PVD coating facility is pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/16C23C14/56C23C14/58
CPCC23C14/022C23C14/16C23C14/562C23C14/5886C23C14/564C11D2111/16C23C14/021C23C14/35
Inventor E·策斯特贝尔亨T·F·J·马尔曼J·J·H·韦塞林克
Owner TATA STEEL NEDERLAND TECH BV