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Heating device and photoetching equipment

A technology of heating device and heating part, which is applied in the direction of photosensitive material processing, etc., and can solve the problem that the glass substrate and the heating plate are not easy to separate, etc.

Active Publication Date: 2018-04-27
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Embodiments of the present invention provide a heating device and photolithography equipment, which are used to solve the problem that the glass substrate and the heating plate are not easily separated after the pre-baking or post-baking process

Method used

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  • Heating device and photoetching equipment
  • Heating device and photoetching equipment
  • Heating device and photoetching equipment

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Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0030] The embodiment of the present application provides a heating device, such as figure 1 As shown, a heating plate 10 is included. Wherein, the heating plate 10 includes a plurality of sub-heating parts 101 .

[0031] Adjacent sub-heating parts 101 are connected by movable connectors 102 . Optionally, the movable link 102 may be a hinge. In this case, two adjacent sub-heating parts 101 can move relative to each other through the movable link 102 , so as...

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Abstract

An embodiment of the invention provides a heating device and photoetching equipment, relates to the technical field of display, and aims to solve the problem that a glass substrate and a heating platecannot be separated easily after a pre-baking or post-baking process is finished. The heating device comprises the heating plate and a plurality of positioning parts and is characterized in that theheating plate comprises a plurality of sub-heating parts; every two adjacent sub-heating parts are connected through a movable connector and are folded or unfolded through the movable connector; eachpositioning part is located at the connection position of every two adjacent sub-heating parts and used for limiting the included angle between every two adjacent sub-heating parts. The heating deviceis used for heating the substrate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a heating device and photolithography equipment. Background technique [0002] TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Transistor Liquid Crystal Display), as a flat panel display device, has become more and more popular due to its small size, low power consumption, no radiation and relatively low production cost. It is widely used in the field of high-performance display. [0003] During the manufacturing process of TFT-LCD, in order to form a preset thin film pattern, it is necessary to perform a photolithography process on the thin film layer. Wherein, in the above photolithography process, after the photoresist is coated on the glass substrate, it is necessary to perform pre-baking (SoftBake), exposure, development and post-baking (Hard Bake) processes on the photoresist. [0004] In the prior art, a heating plate is used to heat the glass substrate ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/38G03F7/40
CPCG03F7/38G03F7/40
Inventor 毛元杰卢凯李京鹏
Owner BOE TECH GRP CO LTD