A method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine

Abstract

The invention relates to a method for improving the exposure area of ​​a 4-inch plate produced by a step-by-step compacting machine. The exposure area is input in the exposure area of ​​the mask plate, and a coordinate system is established according to the exposure area; Expose at the step distance in the direction to get the compact version; shift up the top line of the exposed compact version to obtain the coordinates after the upward shift; at the same time, shift down the bottom row of the exposed compact version, Get the coordinates after the downward shift; take the coordinates after the upward shift as the origin, and expose the compact version after the upward shift according to the step distance of the X-axis and Y-axis directions; take the coordinates after the downward shift as At the origin, exposure is performed on the compact version shifted down according to the step distance in the X-axis and Y-axis directions. The invention improves the production area of ​​4-inch mask, meets market demand, increases economic benefits, breaks through the limitation of equipment, and solves the problem that the Y-direction length cannot exceed 76mm under the limitation of 4-inch plate frame and focus.

Description

technical field [0001] The invention relates to the field of semiconductor plate making, in particular to a method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine. Background technique [0002] Normally, the distance between the left and right frame of the 4-inch mask plate is limited to within 76mm in the X direction. The programming menu can only input one size, which means that the maximum length in X and Y directions is the same value. The maximum length of the program menu for making 4-inch version can only be 76mm. If it exceeds 76mm, the starting point of the machine will focus on the frame in the X direction. , causing flatness problems, making it impossible to make a mask. To make a reticle with a maximum of 76mm in the X direction and more than 76mm in the Y direction, unless you use a 5-inch frame and a 5-inch plate, and then cut it into 4 inches after production, you cannot make a 4-inch reticle that exceeds ...

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine, increasing the area for making a mask, and solving the problem that the Y-direction length cannot be adjusted under the limitation of a 4-inch plate frame and focusing Problems over 76mm

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