Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

50results about How to "Large product area" patented technology

Luminous display with round tip-shaped double-gate controlled spring water-sprayed cathode structure

The invention discloses a luminous display with round tip-shaped double-gate controlled spring water-sprayed cathode structure, which comprises a vacuum chamber formed by a front glass sealing panel, a back glass sealing panel and a transparent glass frame. The front glass sealing panel is provided with an anode conductive layer, a luminescent layer on the anode conductive layer and an anode outer wiring layer connected with the anode conductive layer. The back glass sealing panel is provided with the round tip-shaped double-gate controlled spring water-sprayed cathode structure. The display also comprises isolation walls and getter attached components in the vacuum chamber. The luminous display of the invention has the advantages of being manufactured at low production cost and through simple production process while achieving high brightness.
Owner:山东千沐云物联科技股份有限公司

Cultivation technology and prevention and control method of watermelons

The invention relates to the cultivation technology and a prevention and control method of watermelons, and relates to the field of the planting of melons and fruits, in particular to the technology for producing the watermelons without pollution by methods such as the selection of high-quality seeds, reasonable rotation of crops, scientific fertilization, prevention and control of pests and the like in the cultivation process. In the conventional watermelon planting, planters are unquestioning at the beginning of seed selection and do not treat seeds well, seedling management in the planting process is performed by experience, pesticide application is unreasonable in the prevention and control of the pests, the conditions such as premature drop, blossom drop, crazy seedling, fruit cracking and the like occur in the planting process to influence the yield and quality of the watermelons, and simultaneously, the phenomenon of pesticide residues is serious. Therefore, in order to improve the quality of the watermelons and provide the reference for the cultivation of the watermelons and the prevention and control of the pests, in the process of cultivation, fertilization control, the selection of the high-quality seeds and reasonable rotation of crops and irrigation are mastered, and simultaneously, fine planting and careful management and timely harvesting are performed.
Owner:宋吉昌

Light emitting display of multi-angle straight arc combination silver gate control different skew surface segmentation large skirt cathode structure

The invention relates to a light emitting display of a multi-angle straight arc combination silver gate control different skew surface segmentation large skirt cathode structure. The light emitting display comprises a vacuum chamber composed of an upper stiff encapsulated anti-pressure plate, a lower stiff encapsulated anti-pressure plate and a transparent glass frame, an anode low resistance film transfer layer, an anode extension thick film layer connected with the anode low resistance film transfer layer and a phosphor powder layer prepared on the anode low resistance film transfer layer are arranged on the upper stiff encapsulated anti-pressure plate, the multi-angle straight arc combination silver gate control different skew surface segmentation large skirt cathode structure is arranged on the lower stiff encapsulated anti-pressure plate, and a getter and insulation cylinder ancillary components are arranged in the vacuum chamber. The light emitting display of the multi-angle straight arc combination silver gate control different skew surface segmentation large skirt cathode structure has the advantages of high glow brightness, stable production process, excellent adjustment performance of luminous gray scales, and short response time.
Owner:阜阳市战千里知识产权运营有限公司

Luminous backlight source of angular thorn circumferential double-connection-surface cathode alternate oblique bow gating structure

InactiveCN110676141AReflect the control functionIncreased effective spacingTube/lamp screens manufactureSolid cathode detailsGlass sheetMaterials science
The invention discloses a luminous backlight source of an angular thorn circumferential double-connection-surface cathode alternate oblique bow gating structure. The backlight source comprises a vacuum sealing body and a getter accessory component located in the vacuum sealing body. The vacuum sealing body is composed of a front transparent hard glass plate, a rear transparent hard glass plate anda narrow glass frame strip. An anode pad film conduction layer, an anode gray silver-connected electric layer and a thin light-emitting layer are arranged on the front transparent hard glass plate. The anode pad film conduction layer is connected with the anode gray silver-connected electric layer, and the thin light-emitting layer is manufactured on the anode pad film conduction layer. The reartransparent hard glass plate is provided with an angular thorn circumferential double-connection-surface cathode alternate oblique bow gating structure. The luminous backlight source has advantages that a manufactured structure is simple, light-emitting brightness of the luminous backlight source is high and light-emitting gray scale adjustable performance of the luminous backlight source is excellent.
Owner:JINLING INST OF TECH

Method for improving exposure area of 4-inch mask manufactured through step-and-repeat final reaction system

The invention relates to a method for improving the exposure area of a 4-inch mask manufactured through a step-and-repeat final reaction system. The method comprises the steps of inputting the exposure area into an exposure area of the mask and building a coordinate system according to the exposure area; exposing a first minification mask according to step pitches in an X-axis direction and a Y-axis direction to obtain a final minification mask; shifting the top row of the exposed final minification mask to obtain an upshifted coordinate; shifting the bottom row of the exposed final minification mask to obtain a down-shifted coordinate; taking the upshifted coordinate as an original point and exposing the upshifted final minification mask according to the step pitches in the X-axis direction and the Y-axis direction; and taking the down-shifted coordinate as the original point and exposing the down-shifted final minification mask according to the step pitches in the X-axis direction and the Y-axis direction. According to the method, the manufactured area of the 4-inch mask is improved, the market requirements are met, the economic benefits are increased, the limitation of equipmentis broken through and the problem that the Y-direction length cannot exceed 76mm under the limitations of a 4-inch mask frame and focusing is solved.
Owner:NO 47 INST OF CHINA ELECTRONICS TECH GRP

A method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine

The invention relates to a method for improving the exposure area of ​​a 4-inch plate produced by a step-by-step compacting machine. The exposure area is input in the exposure area of ​​the mask plate, and a coordinate system is established according to the exposure area; Expose at the step distance in the direction to get the compact version; shift up the top line of the exposed compact version to obtain the coordinates after the upward shift; at the same time, shift down the bottom row of the exposed compact version, Get the coordinates after the downward shift; take the coordinates after the upward shift as the origin, and expose the compact version after the upward shift according to the step distance of the X-axis and Y-axis directions; take the coordinates after the downward shift as At the origin, exposure is performed on the compact version shifted down according to the step distance in the X-axis and Y-axis directions. The invention improves the production area of ​​4-inch mask, meets market demand, increases economic benefits, breaks through the limitation of equipment, and solves the problem that the Y-direction length cannot exceed 76mm under the limitation of 4-inch plate frame and focus.
Owner:NO 47 INST OF CHINA ELECTRONICS TECH GRP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products