A Continuous Atomic Layer Deposition Equipment for Surface Coating of Nanoparticles

Abstract

The invention belongs to the field of atomic layer deposition, and particularly discloses continuous atomic layer deposition equipment used for nano-particle surface wrapping. The continuous atomic layer deposition equipment comprises a feeding bin, a first reaction chamber, a second reaction chamber and a discharging bin, the feeding bin is used for controlling nano-particles to enter the first reaction chamber, and the nano-particles are scattered through a supersonic vibration net in the first reaction chamber to be reacted with a first precursor reactant; the reacted nano-particles enter afirst washing chamber through a first rotary feeding device, and a reaction by-product is blown, washed and removed through gas; the washed nano-particles are fed into the second reaction chamber, and is scattered through a supersonic vibration net in the second reaction chamber to be reacted with a second precursor reactant; the reacted nano-particles enter a second washing chamber through a second rotary feeding device, and a reaction by-product is blown, washed and removed through gas; and the material is finally sent into the discharging bin. By means of the continuous atomic layer deposition equipment, continuous and even deposition of thin films on the surfaces of the nano-particles can be achieved, and agglomeration can be avoided.

Description

technical field [0001] The invention belongs to the field of atomic layer deposition equipment, and more specifically relates to a continuous atomic layer deposition equipment used for coating the surface of nanoparticles. Background technique [0002] Compared with the chemical vapor deposition method or physical vapor deposition method for thin film preparation, atomic layer deposition technology has extremely superior performance, so it is widely used. The atomic layer deposition technology is self-limiting in the reaction process, so the atomic layer deposition technology can deposit nano-scale thin films, and the thickness of the thin film can be precisely controlled by controlling the number of cycles of the reaction. [0003] The thin films obtained by the atomic layer deposition method have good uniformity and shape retention, and have been widely used in the treatment of automobile exhaust, the preparation of solar cells and the coating modification of quantum dots....

AI Technical Summary

Problems solved by technology

In the coating process, nanoparticles are easy to agglomerate, and the existing atomic layer deposition equipment has a limited effect on particle dispersion, and cannot achieve continuous atomic layer deposition on the surface of nanoparticles, that is, nanoparticles are easily deposited during the deposition process. Agglomerated and unable to achieve continuous atomic layer deposition

Therefore, it is necessary to study and design an atomic layer deposition equipment to effectively solve the problem of easy agglomeration of nanoparticles and achieve continuous deposition

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