Film forming method, display substrate, manufacture method thereof and display device
A film forming method and display substrate technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of limiting the efficiency, light color and life of display devices, increasing the surface roughness of thin-film functional layers, and easily producing Problems such as coffee rings, to achieve the effect of inhibiting the increase of the surface roughness of the membrane, improving the morphology of the membrane, and improving the performance
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[0036] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.
[0037] The embodiments of the present invention aim at the fact that most of the ink solutes used in printing display devices in the prior art are π-conjugated compounds, which are easy to gather due to π-π stacking, resulting in an increase in the surface roughness of the formed thin film functional layer, which seriously limits the display. To solve the problem of improving device efficiency, light color, and lifespan, a film forming method, a display substrate and its manufacturing method, and a display device are provided, which can improve the film morphology of the printed film, thereby improving the performance of the display device.
[0038] The embodiment of the present invention provides a film forming method, comprising:
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